1998
DOI: 10.1557/jmr.1998.0026
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A study of barium strontium titanate thin films for use in bypass capacitors

Abstract: Physical and electrical characterization techniques have been applied to the problem of developing a lower temperature process for spin-on Ba 0.7 Sr 0.3 TiO 3 thin films and capacitors compatible with on-chip aluminum metallization. The films were prepared by spin-coating from carboxylate precursors and were processed at temperatures between 650 ± C and 450 ± C. Capacitors annealed at higher temperatures have a dielectric constant (k) of 382, a C͞A of 20 fF͞mm 2 , and a leakage current density of 2 3 10 27 A͞c… Show more

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Cited by 39 publications
(27 citation statements)
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“…Ferroelectric thin films such as barium strontium titanate, lithium tantalate, and lithium niobate can be manufactured by using CSD method and then performed by the spin coating process [1]. CSD method is one of the methods to create/develop thin films [2][3][4][5][6][7][8][9][10][11][12], which has advantages including the ability to control the film stoichiometry with good quality, easy procedure, require relatively low cost, and generate a good crystalline phase [13][14][15]. In addition, thin films can also be fabricated by other methods such as metal organic chemical vapor deposition (MOCVD) [16][17][18], chemical vapor deposition [19], sol-gel [20][21][22][23], atomic layer deposition (ALD) [24], metal organic decomposition (MOD) [25], pulsed laser ablation deposition (PLAD) [26,27], and RF sputtering [2,21,28].…”
Section: Introductionmentioning
confidence: 99%
“…Ferroelectric thin films such as barium strontium titanate, lithium tantalate, and lithium niobate can be manufactured by using CSD method and then performed by the spin coating process [1]. CSD method is one of the methods to create/develop thin films [2][3][4][5][6][7][8][9][10][11][12], which has advantages including the ability to control the film stoichiometry with good quality, easy procedure, require relatively low cost, and generate a good crystalline phase [13][14][15]. In addition, thin films can also be fabricated by other methods such as metal organic chemical vapor deposition (MOCVD) [16][17][18], chemical vapor deposition [19], sol-gel [20][21][22][23], atomic layer deposition (ALD) [24], metal organic decomposition (MOD) [25], pulsed laser ablation deposition (PLAD) [26,27], and RF sputtering [2,21,28].…”
Section: Introductionmentioning
confidence: 99%
“…This is in contrast to Pb(Ti, Zr)O 3 films, which can easily be grown by the solgel method into a columnar or epitaxial structure, because of heterogeneous nucleation from a nanocrystalline pyrochlore phase into the perovskite phase at the substrate [13]. (iii) The tetragonality (c/a) of BST films decreases with the increasing of strontium content [7], and a small c/a value may not be sufficient to create charge separation and spontaneous polarization in the films [14], so the fabrication of BST ferroelectric film is more difficult than that of BaTiO 3 . A sol-gelderived ferroelectric BaTiO 3 film on a Pt/Ti/SiO 2 /Si substrate that showed a good ferroelectric hysteresis loop has recently been reported by Sharma et al [15].…”
mentioning
confidence: 94%
“…Compared to other deposition methods, the sol-gel process offers some advantages, such as homogeneity, stoichiometry control, and the ability to coat large and complex area substrates. However, the sol-gel-derived BST films always fail to display pronounced ferroelectric hysteresis loops [6][7][8][9][10]. This makes the sol-gel-derived BST thin films unsuitable for uncooled infrared detector applications.…”
mentioning
confidence: 99%
“…Thin BaTiO 3 (BT) and Ba 0.5 Sr 0.5 TiO 3 (BST) is a well known dielectric material and has been attractive for the applications such as capacitors and high density dynamic random access memory (DRAM) due to its high dielectric constant and high capacity of charge storage [1,2] and solar cell [3].…”
Section: Introductionmentioning
confidence: 99%
“…BT and BST films can be formed by various methods, such as chemical solution deposition (CSD) [1,2,4], metal organic chemical vapor deposition (MOCVD) [5][6][7], rf sputtering [8][9][10][11][12][13] and Pulsed Laser Ablation Deposition (PLAD) [14]. CSD Method is of particular interest because of its good control of stoichiometry, ease of fabrication and low temperature synthesis.…”
Section: Introductionmentioning
confidence: 99%