A study of implant damage induced thin oxide film expansion during photoresist dry etching

Lin, Kuang-Peng; Ching, Kai-Ming; Huang, Kwo-Shu; Hsu, S. L.

doi:10.1109/relphy.2000.843947

2000 IEEE International Reliability Physics Symposium Proceedings. 38th Annual (Cat. No.00CH37059)

DOI: 10.1109/relphy.2000.843947

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A study of implant damage induced thin oxide film expansion during photoresist dry etching

Kuang-Peng Lin

Kai-Ming Ching

Kwo-Shu Huang

et al.

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A study of implant damage induced thin oxide film expansion during photoresist dry etching

Cited by 1 publication

References 2 publications

Neural decision directed segmentation of silicon defects

Neural decision directed segmentation of silicon defects

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