A study of semiconductor nanostructures formed by surface modification

Abstract

Semiconductor nanostructures formed by a surface modification process caused by ion sputtering is studied in this thesis. The microscopic dynamics of the semiconductor surface undergoing ion impingement is discussed in detail. Due to the promising controllability and minimal damage creation on the substrate, low ion ABSTRACT iv suggests that the reported fabrication technique is significant for applications that aim to improve the radiative efficiency of GaAs/AlGaAs QDs by RTA without introducing large undesirable blueshift.