AlGaN/GaN high electron mobility transistor, AlGaAs/InGAs/GaAs pseudomorphic HEMT, and InAlAs/InGaAs metamorphic HEMT ͑MHEMT͒ epitaxial structures have been characterized using surface photovoltage spectroscopy. The effects of the transistor top and bottom delta-doping levels ␦ top , ␦ bot , and surface charge Q sur on the spectrum features have been studied using numerical simulations. Based on the latter, an empirical model has been developed, which allows extraction and comparison of ␦ top , ␦ bot , and Q sur and is applicable for both double-sided and single-sided delta-doped structures. Prediction of the final device performance by the model is shown for two MHEMT structures. Devices produced on these structures show maximum drain currents, which correlate well with ␦ top values calculated using the model.