2011
DOI: 10.1007/s11581-011-0602-y
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A study of the electrodeposition of Co–Cu alloys thin films on FTO substrate

Abstract: In this work, the early stages and the properties of the electrodeposition process of Co-Cu alloys thin films on a fluorine-doped tin oxide (FTO)-coated conducting glass substrate from a sulfate bath were investigated using conventional electrochemical techniques and X-ray diffraction technique (XRD). FTO was chosen as a foreign substrate because of its high transparence and its properties as inert material. Within the potential range analyzed, the kinetics of the Co-Cu electrodeposition corresponded to a mode… Show more

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Cited by 10 publications
(9 citation statements)
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“…Figure 1C demonstrates the growth of trimetallic catalyst (CuZnAg) on the surface of FTO electrode by cathodic chronoamperometry at different values of deposition potentials ranging from −1.1 to −1.4 V vs Ag/AgCl (3 M KCl) in 1 M KOH electrolyte. The cathodic current of the designed catalyst displayed similar behavior as reported by the previous investigators 54‐56 . Furthermore, the synergetic effect of the two metals is obvious from chronoamperometry graphs (Figure 1A,B) i.e., the higher the potential the more the deposition is due to more active sites being available.…”
Section: Resultssupporting
confidence: 83%
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“…Figure 1C demonstrates the growth of trimetallic catalyst (CuZnAg) on the surface of FTO electrode by cathodic chronoamperometry at different values of deposition potentials ranging from −1.1 to −1.4 V vs Ag/AgCl (3 M KCl) in 1 M KOH electrolyte. The cathodic current of the designed catalyst displayed similar behavior as reported by the previous investigators 54‐56 . Furthermore, the synergetic effect of the two metals is obvious from chronoamperometry graphs (Figure 1A,B) i.e., the higher the potential the more the deposition is due to more active sites being available.…”
Section: Resultssupporting
confidence: 83%
“…The SEM micrographs of individual and binary metals deposited on FTO are given in the supporting information (Figures S7‐S10). A literature report also supports the presence of such alloys in the SEM images of CuZn deposition 56 …”
Section: Resultssupporting
confidence: 52%
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“…Among them, Fe-Cu films find applications in electronic industry [2]. Electrodeposition is a versatile growth process for the fabrication of metallic thin film materials, which find applications in electronics, magnetoelectronics, magnetic recording, and microsystems industries due to its some unique features [3][4][5][6][7]. Aside from this, electrodeposition process also provides the deposition under ambient temperature and pressure and does not require relatively expensive equipment [6,8].…”
Section: Introductionmentioning
confidence: 99%