A Study on the Process of ZnO Thin Films Prepared by Ion Beam Sputtering

Abstract

Based on the ion beam sputtering deposition technology, we adopted the reactive sputtering deposition method to accomplish the coating on the glass substrata with ZnO thin films. We used the four-factor and three-level L9(34) orthogonal experiment to obtain the best technological parameters of deposited ZnO thin films: discharge voltage 3.5KV, oxygen current capacity 8SCCM, the coil current 8A, the distance between target and substrata 140mm. The purity of the deposited ZnO thin film is 85.77%, and it has the good crystallization in orientation. The experimental results show that research and development of the ion beam sputtering source is advanced and has a good application value, and the ion beam sputtering deposition technology can be used to deposit the preferred orientation thin films with good performance. The findings have provided the experimental result and the beneficial reference for the ion beam sputtering deposition research.

Preparation and characterization of Cellulose-ZnO nanolayer film by blending method

“…ZnO nanoparticle seeding can be prepared by wet chemical method or sputtering technique. [8][9][10] However, wet chemical method could not properly produce homogeneous distribution of ZnO seed in the matrix layer and it is difficult to prepare hybrid films in bigger size. To overcome this problem we are demonstrating preparation of cellulose-ZnO hybrid free standing films by simple blending method with the help of dispersing agent.…”