1985
DOI: 10.1109/tns.1985.4334443
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A Superconducting Nb3Sn Coated Multicell Accelerating Cavity

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Cited by 35 publications
(22 citation statements)
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“…Moreover, the formation of other phases of lithium silicates and raw materials was already detected for higher mol% concentration of the dopant agent in the reaction mixture (Figs. 2, 3) [31,41,42,48]. Tables 5 and 6 show the crystal sizes of the Nb-doped materials in different dopant amounts via Debye-Scherrer equation.…”
Section: Resultsmentioning
confidence: 99%
“…Moreover, the formation of other phases of lithium silicates and raw materials was already detected for higher mol% concentration of the dopant agent in the reaction mixture (Figs. 2, 3) [31,41,42,48]. Tables 5 and 6 show the crystal sizes of the Nb-doped materials in different dopant amounts via Debye-Scherrer equation.…”
Section: Resultsmentioning
confidence: 99%
“…Also, the measured PXRD data for hydrothermally synthesized undoped lithium metasilicate and lithium disilicate nanoparticles are summarized in Tables 1 and 2 [42][43][44]. Moreover, the intense sharp diffraction patterns suggest that the as-synthesized products are well crystallized.…”
Section: +mentioning
confidence: 99%
“…The diffraction lines at 2θ 13°, 26°and 49°are assigned by their peak positions to the excess Sb 2 O 3 [35]. As shown in Figures 1 and 2, the formation of the other phases of lithium silicates and raw materials was already detected for higher mole percentage concentration of the dopant agent in the reaction mixture [41,42].…”
Section: +mentioning
confidence: 99%
“…Secondly, excessive heating during evaporation can lead to the deformation of the surface of the polymer (the melting point of PMMA is~110°C), ruining the design of the device and degassing impurities from the mask. This issue occurs, for example, in realizing superconductive mesoscopic devices, which require the deposition of refractory metals (e.g., Nb [9] or V [10]); a consequence of the damage of the mask is the suppression of superconductivity and the increase in the residual resistance ratio of some types of films [11].…”
Section: Introductionmentioning
confidence: 99%