2023
DOI: 10.1109/led.2023.3268024
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A Superior Reverse Characteristics of 1.2 kV 4H-SiC Planar JBS Diode Employing Channeling Implantation

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Cited by 6 publications
(7 citation statements)
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“…The system, consisting of a laser, polarizer, gonio stage, and analyzer, is simple and cost-effective. We conducted experiments on both on-axis and off-axis 4H-SiC (0001) samples, presenting angular dependence results around the [1-100] and [11][12][13][14][15][16][17][18][19][20] rotations. Despite the need for consideration of light incident angles, the performance was comparable to Rutherford backscattering spectrometry.…”
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confidence: 99%
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“…The system, consisting of a laser, polarizer, gonio stage, and analyzer, is simple and cost-effective. We conducted experiments on both on-axis and off-axis 4H-SiC (0001) samples, presenting angular dependence results around the [1-100] and [11][12][13][14][15][16][17][18][19][20] rotations. Despite the need for consideration of light incident angles, the performance was comparable to Rutherford backscattering spectrometry.…”
mentioning
confidence: 99%
“…5) On the other hand, channeling implantation to SiC (including GaN) can be performed by conventional ion implanters with relatively low acceleration energies. [6][7][8][9][10][11][12][13][14][15][16][17] Channeling ion implantation requires the ion beam to align with the crystal channeling axis. For example, Ref.…”
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confidence: 99%
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