1989
DOI: 10.1016/0304-3991(89)90082-x
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A systematic analysis of HREM imaging of sphalerite semiconductors

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Cited by 37 publications
(11 citation statements)
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“…The stacking of {111} planes across coherent twin boundaries can be viewed edge on along the 〈110〉 zone in HRTEM images. Glaisher et al (1989) proposed a method for determining the polarity from HRTEM images from an examination of contrast asymmetries in the lattice fringes as a function the thickness and defocus thickness. The projected distance between sublattices in beyond the resolving power of most medium-voltage HRTEMs (Phillipp et al, 1994a).…”
Section: Crystal Polarity Dislocations and Grain Boundariesmentioning
confidence: 99%
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“…The stacking of {111} planes across coherent twin boundaries can be viewed edge on along the 〈110〉 zone in HRTEM images. Glaisher et al (1989) proposed a method for determining the polarity from HRTEM images from an examination of contrast asymmetries in the lattice fringes as a function the thickness and defocus thickness. The projected distance between sublattices in beyond the resolving power of most medium-voltage HRTEMs (Phillipp et al, 1994a).…”
Section: Crystal Polarity Dislocations and Grain Boundariesmentioning
confidence: 99%
“…In the 〈110〉 projection, the shortest distance between the two sublattices is approximately 0.14 nm for most cubic III-V semiconductors. Imaging along the 〈110〉 zone, the intensity and phase of {111}, and {002} polar reflections acquire appreciable differences that vary with sample thickness (Glaisher et al, 1989). The inability to resolve the different sublattices precludes a direct determination of the crystal polarity from lattice fringes in HRTEM images.…”
Section: Crystal Polarity Dislocations and Grain Boundariesmentioning
confidence: 99%
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“…Focal series reconstruction or iterative reconstruction of exit-plane wave is more suitable for structures and defects where atom positions are not clearly known. A combination of such techniques has been used successfully for imaging interfaces, partially tetrahedrally void filled semiconductors, oxides, solid-liquid interfaces [24,36,[39][40][41] etc. In the present case, as the atomic positions in cubic TiCr 2 Laves phase is known, simulated images could directly be matched with the experimental ones.…”
mentioning
confidence: 99%
“…The <110> projection is most often used for examination of semiconductor interfaces and growth defects, and crystal polarity can usually be determined by studying the characteristic image appearance at certain thicknesses and objective-lens defocus settings. 5 However, individual atomic columns, often referred to as ''dumbbells,'' 6 cannot be separately resolved when imaging in this projection unless {004}-type reflections contribute to the image formation process. This performance requirement is quite demanding and could initially only be achieved by dedicated high-voltage, high-resolution electron microscopes.…”
Section: Introductionmentioning
confidence: 99%