A table-top EUV focusing optical system with high energy density using a modified Schwarzschild objective and a laser-plasma light source

Zhang, Zhe; Li, Wenbin; Huang, Qiushi; Zhong, Zhang; Yi, Shengzhen; Pan, Liuyang; Xie, Changsheng; Wachulak, P.; Fiedorowicz, Henryk; Wang, Zhanshan

doi:10.1063/1.5044752

Cited by 12 publications

(5 citation statements)

References 32 publications

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“…In this domain, reflective and diffractive type elements are generally employed. Multi-layers coated on typical reflective faces are helpful in achieving an acceptable reflectivity and optical aberration [6]. For the wavelength range of 35-50 nm, Sc/Si multi-layer is suitable.…”

Section: Introductionmentioning

confidence: 99%

Focusing and Wavefront Splitting of an Extreme Ultraviolet Laser with a Tubular Optical Element

Cui

Wang

et al. 2023

Photonics

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A capillary discharge extreme ultraviolet laser is focused and wavefront split at 46.9 nm by a tubular optical element. The reflectivity at 46.9 nm is both simulated and measured to be higher than 90% with a slight optical aberration. The operating principle of the tubular element for focusing and wavefront splitting is discussed. Dense and intense grating-like fringes with a period of ~150 nm are achieved. The method used in this work allows nano-scale processing with extreme ultraviolet laser at single-shot exposure mode.

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Section: Introductionmentioning

confidence: 99%

Focusing and Wavefront Splitting of an Extreme Ultraviolet Laser with a Tubular Optical Element

Cui

Wang

et al. 2023

Photonics

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“…High-numerical-aperture (high-NA) optical systems are most suitable for performing such tests in a laboratory owing to the high fluence of EUV radiation [6,7]. Using the simplest high-NA optical system consisting of two mirrors [7], a tabletop EUV focusing optical system with an operational wavelength of 13.5 nm was developed at the Institute of Precision Optical Engineering (IPOE) for investigating the damage of optical elements caused by EUV radiation [8]. This optical system contains a modified Schwarzschild objective [5] with an NA of 0.44 and two mirrors with the same radius of curvature (RoC) equal to 143.82 mm.…”

Section: Introductionmentioning

confidence: 99%

Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique

Zhang

Yao

et al. 2019

Coatings

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In this work, a masking technique was used to improve the thickness uniformity of a Mo/Si multilayer deposited on a curved spherical mirror by direct current (DC) magnetron sputtering with planetary rotation stages. The clear aperture of the mirror was 125 mm with a radius of curvature equal to 143.82 mm. Two different shadow masks were prepared; one was flat and the other was oblique. When using the flat mask, the non-uniformity considerably increased owing to the relatively large gap between the mask and substrate. The deviation between the designed and measured layer thickness and non-uniformity gradually reduced with a smaller gap. The second mask was designed with an oblique profile. Using the oblique mask, the deviation from multilayer thickness uniformity was substantially reduced to a magnitude below 0.8% on the curved spherical substrate over the clear aperture of 125 mm. Multilayers still achieved a smooth growth when deposited with obliquely incident particles. The facile masking technique proposed in this study can be used for depositing uniform coatings on curved spherical substrates with large numerical apertures for high-resolution microscopes, telescopes, and other related optical systems.

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“…The lack of optical devices for light-shape focusing in the EUV region hinders their application in high-performance radiation facilities.To date, several methods exist for focusing EUV radiation into a single point. The functions and characteristics of Schwarzschild mirrors coated by multiple layers (e.g., Sc/Si for 46.9 nm and Mo/Si for 13.5 nm) exhibit a relatively high reflectivity at normal incidence based on the Prague formula; they are more suitable for focusing EUV radiation into a tight focus 19,20 . Fresnel-zone plates (FZP) provide more flexible EUV light focusing to a certain extent 21 ; however, the spatial resolution of FZP is on the order of the width of its outermost zone.Recently, Ossiander et al demonstrated that a metalens could efficiently focus vacuum-guided EUV light 22 .…”

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confidence: 99%

Free light-shape focusing in extreme-ultraviolet radiation with self-evolutionary photon sieves

Cui,

Zhang,

et al. 2024

Sci Rep

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Extreme-ultraviolet (EUV) radiation is a promising tool, not only for probing microscopic activities but also for processing nanoscale structures and performing high-resolution imaging. In this study, we demonstrate an innovative method to generate free light-shape focusing with self-evolutionary photon sieves under a single-shot coherent EUV laser; this includes vortex focus shaping, array focusing, and structured-light shaping. The results demonstrate that self-evolutionary photon sieves, consisting of a large number of specific pinholes fabricated on a piece of Si3N4 membrane, are capable of freely regulating an EUV light field, for which high-performance focusing elements are extremely lacking, let alone free light-shape focusing. Our proposed versatile photon sieves are a key breakthrough in focusing technology in the EUV region and pave the way for high-resolution soft X-ray microscopy, spectroscopy in materials science, shorter lithography, and attosecond metrology in next-generation synchrotron radiation and free-electron lasers.

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A table-top EUV focusing optical system with high energy density using a modified Schwarzschild objective and a laser-plasma light source

Cited by 12 publications

References 32 publications

Focusing and Wavefront Splitting of an Extreme Ultraviolet Laser with a Tubular Optical Element

Focusing and Wavefront Splitting of an Extreme Ultraviolet Laser with a Tubular Optical Element

Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique

Free light-shape focusing in extreme-ultraviolet radiation with self-evolutionary photon sieves

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