A three phase rotating field microwave plasma design for a low-flow helium plasma generation

Jankowski, Krzysztof; Ramsza, Andrzej; Reszke, Edward; Strzelec, Michal

doi:10.1039/b904428k

Cited by 20 publications

(13 citation statements)

References 11 publications

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“…For ICP the two-line method applied by Kawaguchi et al [29] was used for estimating the rotational temperature. For both argon and helium MIP T rot was determined from the slope of the Boltzmann plot using rotational lines ranging in wavelength from 305.0 to 315.0 nm belonging to the Q1 branch, as was reported for MIP by Jankowski et al [30]. Additionally, to assess ICP robustness the intensity ratio for the line pair Mg(II) 280.270/Mg(I) 285.213 nm was determined.…”

Section: The Effect Of Ptsc Temperature On Plasma Characteristicsmentioning

confidence: 99%

Effect of temperature on direct chemical vapor generation for plasma optical emission spectrometry: An application of programmable temperature spray chamber

Giersz

Jankowski

2016

Microchemical Journal

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Section: The Effect Of Ptsc Temperature On Plasma Characteristicsmentioning

confidence: 99%

Effect of temperature on direct chemical vapor generation for plasma optical emission spectrometry: An application of programmable temperature spray chamber

Giersz

Jankowski

2016

Microchemical Journal

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“…21 These excitation temperatures are comparable to others measured for low-power atmospheric pressure helium discharges, but lower than those of high-power torches. Yoshiki and Horiike measured an excitation temperature of 1900 K for a capacitively-coupled plasma at 5 W. 10 In an RF discharge at higher powers of 25-50 W, Sun and Sturgeon found temperatures of 2900-3200 K. A microwave torch operating at 150 W was found to have excitation temperatures of 3500-4000 K. 22…”

Section: Excitation Temperaturesmentioning

confidence: 99%

Low-power microwave-generated helium microplasma for molecular and atomic spectrometry

Hoskinson

Hopwood

Bostrom

et al. 2011

J. Anal. At. Spectrom.

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Atmospheric pressure microplasmas are a promising technology for low-power optical emission spectroscopy for chemical detection. In this work, we examine a microstrip split-ring resonator (MSRR) discharge operating at 1.8 GHz in helium as an excitation source. The source can sustain a plasma with as little as 0.2 W of microwave power, and can be operated continuously with no electrode damage. With a compact 156 mm focal length spectrometer system, we determined detection limits on the order of 1 ppm for methane, n-butane, carbon dioxide, and hydrogen sulfide with plasma powers of both 0.3 and 1.0 W. With appropriate choice of the monitored emission lines, the detection system is robust to small additions of air. We also demonstrate the applicability of the MSRR as a sensor for gas chromatography.

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“…Next, moderate and high-power annular-plasma sources appeared including Okamoto cavity, 20 TEM cavity, 21 Hammer cavity 22 as well as multi-electrode approaches 23 applying nonstationary elds which are rotating around the plasma axis, and MWP atomic spectroscopy became a powerful tool for elemental analysis of liquids. Both wet and dry aerosols, and even slurries could be introduced into the plasma.…”

Section: Introductionmentioning

confidence: 99%

Recent developments in instrumentation of microwave plasma sources for optical emission and mass spectrometry: Tutorial review

Jankowski

Reszke²

2013

J. Anal. At. Spectrom.

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This paper reviews the most common methods of generation of plasmas using microwaves with special emphasis on recently developed microwave plasma (MWP) sources for analytical applications. The art and science of microwave plasma optical and mass spectroscopy instrumentation (MWP-OES/MS), and the applications are briefly presented, including very recent advances in the field as of 2012. The design and operation of MWPs is discussed to provide a basic understanding of the most important selection criteria when designing MWP systems. The various plasma generation systems described include single-electrode capacitive microwave plasmas, electrodeless inductively coupled plasmas, multi-electrode systems energized with stationary or rotating fields. We also discuss various technical realizations of MWP sources for selected applications. Examples of technical realizations of plasmas in closed structures (cavities), in open structures (surfatrons, planar plasma sources), and in magnetic fields (Hammer cavity) are discussed in detail. Finally, we mention micro-and mini-discharges as convenient sources for miniaturized spectrometric systems. Specific topics include fundamental aspects of MWP, i.e., recent advances in the construction of analytical MWPs (coaxially coupled cavities, strip-line technology, multi-point energizing, power combining, rotating fieldexcited plasmas), operational characteristics, analytical characteristics and applications. Special reference is made to coupling with OES for determination of chromatographic effluents and particle sizing. The developments in elemental and molecular MS applications in both low-power and high-power MWPs are also discussed.

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A three phase rotating field microwave plasma design for a low-flow helium plasma generation

Cited by 20 publications

References 11 publications

Effect of temperature on direct chemical vapor generation for plasma optical emission spectrometry: An application of programmable temperature spray chamber

Effect of temperature on direct chemical vapor generation for plasma optical emission spectrometry: An application of programmable temperature spray chamber

Low-power microwave-generated helium microplasma for molecular and atomic spectrometry

Recent developments in instrumentation of microwave plasma sources for optical emission and mass spectrometry: Tutorial review

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