2013
DOI: 10.1016/j.sse.2012.08.003
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A unified analytical continuous current model applicable to accumulation mode (junctionless) and inversion mode MOSFETs with symmetric and asymmetric double-gate structures

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Cited by 57 publications
(14 citation statements)
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“…where ( ) is the spatially varying doping distribution in the silicon body (can be continuous or discrete). Consideration of fixed and mobile charge density in a lightly-doped silicon body is required from the accuracy point of view [31,32]. Because, the effect of mobile charge density cannot neglected in the above subthreshold regime [33] and its inclusion in Poisson's equation enhances the model accuracy [55].…”
Section: ) Lu and Taur Model [16]mentioning
confidence: 99%
“…where ( ) is the spatially varying doping distribution in the silicon body (can be continuous or discrete). Consideration of fixed and mobile charge density in a lightly-doped silicon body is required from the accuracy point of view [31,32]. Because, the effect of mobile charge density cannot neglected in the above subthreshold regime [33] and its inclusion in Poisson's equation enhances the model accuracy [55].…”
Section: ) Lu and Taur Model [16]mentioning
confidence: 99%
“…Recently, Junctionless (JL) MOS-FET has been proposed which has the similar doping concentration within the channel and source/drain (S/D) regions (Colinge et al 2010;Jin et al 2013). Junctionless (JL) MOSFET has no abrupt junctions between source/ drain (S/D) and channel region which can be seen as n-nn-type (n-channel) or p-p-p-type (p-channel) (Sorée et al 2008;Lee et al 2009) so that it is called Junctionless.…”
Section: Introductionmentioning
confidence: 99%
“…The performance evaluation of [2], the performance of inversion, accumulation, and junctionless mode n-type and p-type Bulk Silicon FinFETs [3], the influence of channel random dopant of JL FETs [4,5], and the device physics of JL FETs with double-gate or surrounding-gate structures [6][7][8][9][10][11][12][13][14][15] have been widely reported. The gate controllability of JL FETs with multi-gate structures such as double-gate, triple-gate, and surrounding-gate shows much better subthreshold characteristics compared to normal planar gate-based JL FETs [6][7][8][9].…”
Section: Introductionmentioning
confidence: 99%