“…The Poole-Frenkel (PF) effect (1,2), a mechanism of field-enhanced thermal emission of charge carriers from bulk traps, is often used to explain conduction in thin dielectric films and enhanced currents in semiconductor materials and devices. PF emission is often observed in dielectric materials, such as SiO 2 (3,4,5,6) and Si 3 N 4 (7,8). This leakage mechanism has also been observed in high-k dielectrics, such as Ta 2 O 5 and BaSrTiO 3 (9), Al 2 O 3 (10), and rare earth oxides such as Eu 2 O 3 (11) and HfO 2 (12,13).…”