2011 IEEE 23rd International Symposium on Power Semiconductor Devices and ICs 2011
DOI: 10.1109/ispsd.2011.5890830
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A versatile 30V analog CMOS process in a 0.18μm technology for power management application

Abstract: a versatile 30V analog CMOS process in a 0.18 µm technology node has been developed by using cost-effective and modular fashion. To reduce the thermal budget deep NWELL isolation is formed after CMOS well formation. The drainextended (DE) CMOS from 7V to 30V shows very competitive trade-off performance between the breakdown voltage and the specific on-resistance. In addition, low 1/f noise of 5V CMOS can be obtained by pure gate oxide process.

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Cited by 10 publications
(2 citation statements)
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“…In addition, higher voltage DECMOS is provided for applications requiring up to 20-30 V (Chap. 7) [29]. Equally important in analog CMOS is the extensive characterization needed on all components to document the second-and third-order effects, such as matching, temperature coefficients, and voltage coefficients (Chaps.…”
Section: Analog Cmos Technologymentioning
confidence: 99%
“…In addition, higher voltage DECMOS is provided for applications requiring up to 20-30 V (Chap. 7) [29]. Equally important in analog CMOS is the extensive characterization needed on all components to document the second-and third-order effects, such as matching, temperature coefficients, and voltage coefficients (Chaps.…”
Section: Analog Cmos Technologymentioning
confidence: 99%
“…They are used in analog and power management designs where high drain-to-source voltages are required. These voltages can range from 20 to 40 V in 130-nm and 180-nm processes, and from 5 to 8 V in 65-nm processes and beyond [29,30]. In DEMOS transistors, however, the gate-to-source voltage is limited by the CMOS gate oxide thickness which remains unchanged.…”
Section: Design and Characteristics Of Demosmentioning
confidence: 99%