2018
DOI: 10.1039/c8ra03398f
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A vertical WSe2–MoSe2 p–n heterostructure with tunable gate rectification

Abstract: Here, we report the synthesis of a vertical MoSe 2 /WSe 2 p-n heterostructure using a sputtering-CVD method. Unlike the conventional CVD method, this method produced a continuous MoSe 2 /WSe 2 p-n heterostructure. WSe 2 and MoSe 2 back-gated field effect transistors (FETs) exhibited good gate modulation behavior, and high hole and electron mobilities of $2.2 and $15.1 cm 2 V À1 s À1 , respectively.The fabricated vertical MoSe 2 /WSe 2 p-n diode showed rectifying I-V behavior with back-gate tunability.The recti… Show more

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Cited by 27 publications
(23 citation statements)
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“…Achieved values for the ideality factor in the n-InGaAs−BP heterojunction diode are higher than that of an ideal diode (η = 1), which is attributed to mainly the trap state and the resistance of the heterojunction in the interface. 32 The ideality factor of ∼1.6 at V G = 40 V for the n-InGaAs−BP heterojunction diode is comparable to the ideality factors of previously reported heterojunction diodes comprising WSe 2 − MoSe 2 (η = ∼1.5), 46 BP−WS 2 (η = ∼1.7), 47 and BP−MoS 2 (η = ∼2.7). 32 The gate-tunable rectifying behavior of n-InGaAs−BP heterojunction diodes is caused by the electrostatic inversion of the BP (Figure S6c), where the Fermi level of BP is modulated by the gate voltage.…”
Section: ■ Results and Discussionsupporting
confidence: 84%
“…Achieved values for the ideality factor in the n-InGaAs−BP heterojunction diode are higher than that of an ideal diode (η = 1), which is attributed to mainly the trap state and the resistance of the heterojunction in the interface. 32 The ideality factor of ∼1.6 at V G = 40 V for the n-InGaAs−BP heterojunction diode is comparable to the ideality factors of previously reported heterojunction diodes comprising WSe 2 − MoSe 2 (η = ∼1.5), 46 BP−WS 2 (η = ∼1.7), 47 and BP−MoS 2 (η = ∼2.7). 32 The gate-tunable rectifying behavior of n-InGaAs−BP heterojunction diodes is caused by the electrostatic inversion of the BP (Figure S6c), where the Fermi level of BP is modulated by the gate voltage.…”
Section: ■ Results and Discussionsupporting
confidence: 84%
“…In Figure c, the core level peaks for 5p 3/2 , W 4f 5/2 , and W 4f 7/2 binding energies are fitted (brown line) and centered at 39.49, 36.12, and 33.96 eV, respectively, in agreement with W 4+ in WSe 2 . Figure d shows the single peak of Se fitted (brown line) and centered at 56.50 eV, which can be divided and attributed to the Se 3d 3/2 and Se 3d 5/2 binding energies with peak positions at 56.72 and 56.33 eV, respectively …”
Section: Resultsmentioning
confidence: 99%
“…Remarkably, no obvious shift of the Te 3d 3/2 , Te 3d 5/2 , and Ge 3d signals is detected, which confirms that the formation of GeTe bond is not dominant on the heterostructure interface. [ 33,34 ] The accurate comparison of spectra between Te film surface without etching and the interface mixing state with 36 s etching level is shown in Figure 1f, which further points to no shift of the Te characteristic peaks between that near the interface of Te/Ge and pure Te. The barely visible XPS peak of Te oxide indicates the Te film possesses excellent air stability, which has shown quite a difference to previous work.…”
Section: Resultsmentioning
confidence: 86%