2011
DOI: 10.1016/j.jprocont.2011.04.004
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A virtual metrology model based on recursive canonical variate analysis with applications to sputtering process

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Cited by 8 publications
(3 citation statements)
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“…e result of applying recursive RO-DPLS to the digester under feedback control have shown that the control performance was improved by feeding estimates back to a PID controller. In the semiconductor industry, Pan et al (2011) proposed an adaptive virtual metrology (VM) based on recursive canonical variate analysis (RCVA) and applied it to an industrial sputtering process.…”
Section: Changes In Process Characteristics and Operatingmentioning
confidence: 99%
“…e result of applying recursive RO-DPLS to the digester under feedback control have shown that the control performance was improved by feeding estimates back to a PID controller. In the semiconductor industry, Pan et al (2011) proposed an adaptive virtual metrology (VM) based on recursive canonical variate analysis (RCVA) and applied it to an industrial sputtering process.…”
Section: Changes In Process Characteristics and Operatingmentioning
confidence: 99%
“…Naik et al 12 proposed two recursive algorithms for fault detection, which are based on the perturbation theory and the orthogonal iterations. Pan and Sheng et al 19 proposed an online virtual metrology approach based on recursive CVA with application to an industrial sputtering process. In addition, a few monitoring approaches based on the multivariate statistical theory have also been proposed.…”
Section: Introductionmentioning
confidence: 99%
“…It uses statistical tools such as multiple linear regression, Canonical Variate Analysis (CVA), Neural Networks (NNs), and Partial Least Squares (PLS) to predict the response of process output. Typically, Pan et al (2011aPan et al ( , 2011b applied stepwise regression, CVA, and analysis of covariance models to construct VM model for sputtering and wafer acceptance test problems in semiconductor manufacturing. Chang et al (2006), Su et al (2006), andHung et al (2007) applied NNs to build a VM system for a sputtering process in thin film transistor-liquid crystal display industries, chemical mechanical planarization, and chemical vapor deposition processes in semiconductor manufacturing, respectively.…”
Section: Introductionmentioning
confidence: 99%