A x-ray photoelectron spectroscopy study of the diffusion of iron, nickel and cobalt through gold films

Swartz, W. E.; Linn, J. H.; Ammons, James M.; Kovac, M.G.

doi:10.1016/0040-6090(84)90134-2

Cited by 14 publications

(3 citation statements)

References 8 publications

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“…Considering the fact that the volume of the Fe layer is twice that of the Au layer, the Au-Fe mixture is unable to accommodate all Fe atoms, leaving undissolved Fe behind in an Fe layer. The undissolved Fe is most likely residing on top of the Au-Fe mixture, with the topmost surface layer being oxidized during annealing, as it has been shown in the literature that Fe tends to diffuse toward an oxidative atmosphere [26]. This is supported, and at the same time explains, the appearance of Fe 2 O 3 later on in the XRD patterns.…”

supporting

confidence: 61%

Thermally induced substitutional reaction of Fe into Mo₂GaC thin films

Lai

Petruhins

et al. 2017

Materials Research Letters

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The first Fe-based MAX phase is realized by solid-state substitution reaction of an Fe/Au/Mo 2 GaC thin-film diffusion couple, as determined by X-ray diffraction and scanning transmission electron microscopy. Chemical analysis together with elemental mapping reveals that as much as 50 at.% Fe on the A site can be obtained by thermally induced Au and Fe substitution for Ga atomic layers in Mo 2 GaC. One-sixth of the original Ga is also replaced by Au atoms. When annealing Mo 2 GaC thin films covered with Fe only, the Mo 2 GaC phase remains intact, that is, Au acts as a catalyst for the substitution reaction. IMPACT STATEMENT The first direct evidence showing Fe-containing MAX phase, Mo 2 AC, with Fe ∼ 50 at.% on the A sites is presented, synthesized by thermally induced Fe and Au substitution reaction catalyzed by Au.

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supporting

confidence: 61%

Thermally induced substitutional reaction of Fe into Mo₂GaC thin films

Lai

Petruhins

et al. 2017

Materials Research Letters

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“…Comparing the average Q value of 0.81 eV from the two methods with the corresponding value of 1.81 eV reported from bulk diffusion data 17 gives further evidence that grain boundaries and high defect density play a dominant role in the diffusion process of the investigated films. Table 1 shows that there is a disagreement between the diffusion parameters extracted from the present work and those reported by Swartz et al 6 The discrepancy can be attributed essentially to the difference in the microstructure of the investigated films, 22 which is controlled by the preparation conditions and the heat treatment environment. Swartz et al annealed their samples in air and the driving force for diffusion in this case is the oxidation of Ni at the Au surface.…”

Section: Discussioncontrasting

confidence: 69%

Interdiffusion coefficients and conductivity in gold/nickel bilayer thin films on silicon(111) wafers

Abdul-Lettif

Rammo

Makadsi

2001

Surface & Interface Analysis

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Interdiffusion in the gold/nickel bilayer thin films deposited on silicon(111) wafers in the temperature range 200-500• C has been studied using x-ray photoelectron spectroscopy (XPS), sheet resistance measurements (SRM) and x-ray diffraction. Two independent methods have been used to determine the diffusion coefficients: the accumulation concentration of nickel on the gold surface using XPS; and the variation of sheet resistance as a function of annealing time and temperature.The diffusion coefficients deduced from XPS and SRM are (4.0 × 10 −11 cm 2 s −1 ) exp.−0.79 eV/kT/ and (4.8 × 10 −11 cm 2 s −1 ) exp.−0.83 eV/kT/, respectively. It is shown that diffusion of nickel through the gold layer causes a considerable loss in conductivity of the bilayer thin films.

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“…The ultra-high vacuum surface sensitive technique that is generally considered to provide the most chemical information is X-ray photoelectron spectroscopy (XPS). XPS is routinely finding application in such diverse areas as heterogeneous catalysis (2, 3), semiconductor materials (4,5), polymers (6-8), thin films (5,9), chemisorption (70, 11), etc. The diverse areas of application ensure that the professional chemist will have occasion to employ surface analysis techniques such as XPS or need to know their basic principles in their specific areas of interest.…”

mentioning

confidence: 99%

Variable-angle X-ray photoelectron spectroscopic determination of the thickness of the oxide layer on aluminum metal: An advanced undergraduate laboratory experiment

King¹,

Swartz²

1987

J. Chem. Educ.

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Surface analysis is one area stressed in the Pimentel Report Opportunities in Chemistry (1). The ultra-high vacuum surface sensitive technique that is generally considered to provide the most chemical information is X-ray photoelectron spectroscopy (XPS). XPS is routinely finding application in such diverse areas as heterogeneous catalysis (2, 3), semiconductor materials (4,5), polymers (6-8), thin films (5,9), chemisorption (70, 11), etc. The diverse areas of application ensure that the professional chemist will have occasion to employ surface analysis techniques such as XPS or need to know their basic principles in their specific areas of interest. In an attempt to provide an opportunity for the undergraduate student to apply XPS to a typical analytical problem, we developed a simple variable-angle XPS experiment designed to measure the thickness of the oxide layer on aluminum metal for use in the Methods of Chemical Investigation course. Methods is an integrated, two-semester, lecture/laboratory sequence generally taken by seniors in the ACS-certified BS curriculum at the University of South Florida. Background X-ray photoelectron spectroscopy is concerned with the measurement of core-electron binding energies (12). A molecule or atom is bombarded with an X-ray of sufficient energy to eject an electron. The kinetic energies of the photoelectrons are then measured by an electron analyzer. The coreelectron binding energies (E\,) relative to the Fermi level can then be compared via the simple relationship E^E'-Ey-W, (1) where Fx is the energy of the exciting X-ray, is the electron kinetic energy, and IT'] is the spectrometer work function, a constant for a given analyzer.The utility of XPS for the chemist is the result of "chemical shifts" that are observed in Ey,. The binding energy of a core electron is affected by the atom's electron density and, thereby, by the oxidation state and/or the chemical environment of the atom. As the oxidation state becomes more

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A x-ray photoelectron spectroscopy study of the diffusion of iron, nickel and cobalt through gold films

Cited by 14 publications

References 8 publications

Thermally induced substitutional reaction of Fe into Mo₂GaC thin films

Thermally induced substitutional reaction of Fe into Mo₂GaC thin films

Interdiffusion coefficients and conductivity in gold/nickel bilayer thin films on silicon(111) wafers

Variable-angle X-ray photoelectron spectroscopic determination of the thickness of the oxide layer on aluminum metal: An advanced undergraduate laboratory experiment

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A x-ray photoelectron spectroscopy study of the diffusion of iron, nickel and cobalt through gold films

Cited by 14 publications

References 8 publications

Thermally induced substitutional reaction of Fe into Mo2GaC thin films

Thermally induced substitutional reaction of Fe into Mo2GaC thin films

Interdiffusion coefficients and conductivity in gold/nickel bilayer thin films on silicon(111) wafers

Variable-angle X-ray photoelectron spectroscopic determination of the thickness of the oxide layer on aluminum metal: An advanced undergraduate laboratory experiment

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Thermally induced substitutional reaction of Fe into Mo₂GaC thin films

Thermally induced substitutional reaction of Fe into Mo₂GaC thin films