2005
DOI: 10.1016/j.mseb.2005.08.095
|View full text |Cite
|
Sign up to set email alerts
|

Ab initio assisted process modeling for Si-based nanoelectronic devices

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
1
0

Year Published

2009
2009
2009
2009

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 54 publications
0
1
0
Order By: Relevance
“…This example demonstrates the needs of using multiscale analysis for understanding the complex processes. Other applications of high-level hybrid methods Richards, Janse, & Gobbert, 2002;Windl, 2005) and in studying chemical reactors (Lin, Sureshkumar, & Kardos, 2001;Raimondeau & Vlachos, 2002). It is hoped that new developments on both theories and computational science facilitate the coupling between the domains, particularly in the case of chemical phenomena.…”
mentioning
confidence: 99%
“…This example demonstrates the needs of using multiscale analysis for understanding the complex processes. Other applications of high-level hybrid methods Richards, Janse, & Gobbert, 2002;Windl, 2005) and in studying chemical reactors (Lin, Sureshkumar, & Kardos, 2001;Raimondeau & Vlachos, 2002). It is hoped that new developments on both theories and computational science facilitate the coupling between the domains, particularly in the case of chemical phenomena.…”
mentioning
confidence: 99%