Ab initio calculations on the modes of incorporation of water in quartz suggest that, apart from the incidental inclusion of molecular water as fluid inclusions, the most prevalent mode of uptake of water in a-quartz is structural and involves the replacement of Si by four protons in a process formally described as the [4H]si substitution. Existing ub initio computer calculations were used as a basis on which to determine the equilibrium concentration of [4H]si defects in quartz as a function of relevant temperatures and pressures. These calculations indicate that [4H] si concentrations are in the range lo-'-10-4/Si atom increasing rapidly with increasing water pressure at constant temperature, while above 300°C the defect concentration decreases monotonically with increasing temperature in all cases, implying that the defects must react on heating to produce molecular water. Ab inirio results have also been used to establish the concentration of interstitial water molecules in quartz under the same conditions. In this case the concentrations are vanishingly small and of the order of IO-''/Si atom at 500°C and l.OGPa, implying that the diffusion coefficient for water on interstitial sites in quartz must also be extremely low.It has recently become apparent that the results of the ab initio based calculations for the concentration of both [4H]si defects and interstitial water molecules are directly relevant to the weakening behaviour in wet quartz on heating. Since the reaction in which [4H]si defects produce molecular water on heating involves a very substantial volume increase and, since the diffusion coefficient for the migration of molecular water on interstitial sites is now known to be prohibitively small, excess water produced on heating cannot escape from the crystal which therefore behaves locally as a. totally closed system, at least within the time frame of conventional laboratory experiments. Here the reaction of [4HIsi defects to give molecular water on heating leads to the development of water bubbles with the concomitant growth of edge dislocations with b = $u(1120), the dislocations taking up the material transfer from the bubble volume in the closed system. At concentrations of [4HIsi defects of the order of IOOppm, the development of a dislocation densities of the order of 108/cm2 can be shown to be reasonable, a figure which is also confirmed from existing electron optical studies of heated wet quartz.