The growing interest
in large-scale underground hydrogen
(H2) storage (UHS) emphasizes the need for a comprehensive
understanding
of the fundamental characteristics of subsurface environments. The
wetting preference of subsurface rock is a crucial parameter influencing
the H2 flow behavior during storage and withdrawal processes.
In this study, we utilized molecular dynamics simulation to evaluate
the wetting preference of the silica surface in subsurface hydrogen
systems, with the aim of addressing disparities observed in experimental
results. We conducted an initial comprehensive assessment of potential
models, comparing the wettability of five common silica surfaces with
different surface morphologies and hydroxyl densities in CO2–H2/water/silica systems against experimental data.
After introducing the INTERFACE force field as the most accurate potential
model for the silica surface, we evaluated the wetting behavior of
the α–quartz (101) surface with a hydroxyl density of
5.9 number/nm2 under the impact of actual geological storage
conditions (333–413 K and 10–30 MPa), the coexistence
of cushion gases (i.e., CO2, CH4, and N2) at various mole fractions, and pH levels ranging from 2
to 11 characterized through considering the negative charges of 0
to −0.12 C/m2 via deprotonation of silanol on the
silica surface. Our results indicate that neither pressure nor temperature
has a significant impact on the wetness of the silica in the case
of pure H2 (single component UHS operations). However,
when CO2 coexists with H2, especially at higher
mole fractions, an increase in pressure and a decrease in temperature
lead to higher contact angles. Moreover, when the mole fraction of
cushion gas ranges from 0 to 1, the contact angle increases 20, 9.5,
and 4.5° for CO2, CH4, and N2, respectively, on the neutral silica substrate. Interestingly, at
higher pH conditions where the silica surface carries a negative charge,
the contact angle considerably reduces where surface charges of −0.03
and −0.06 C/m2 result in an average reduction of
20 and 80% in the contact angle, respectively. More importantly, at
a pH of ∼11 (−0.12 C/m2), a 0° contact
angle is observed for the silica surface under all temperatures, pressures,
types of cushion gases, and varying mole fractions.