Aberration control for 70-nm optical lithography

Sewell, Harry; McClay, James A.; Guzman, Andrew; Lafiandra, Carlo

doi:10.1117/12.425216

Cited by 3 publications

(2 citation statements)

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“…Combining with other active elements, such as element decentration for coma, conjugate spacing for spherical [2], this high fidelity DM could meet the demands of correcting primary aberration and most fifth-order aberration.…”

Section: B Dm In Lithography Lensmentioning

confidence: 98%

“…Carl Zeiss Corp., the leader in this field, proposed adding active optical elements to the lithography objective, including a deformable mirror (DM), for compensating optical aberration in real time in 1999 [1]. During 2001 a DM capable of balancing 5 modes of aberration was used in SVG Corp.'s machine at the 70 nm lithographic node [2]. A basic requirement for DMs in lithography systems that perfect the generation of the desired deformation is hard to satisfy.…”

Section: Introductionmentioning

confidence: 99%

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Concept and modeling analysis of a high fidelity multimode deformable mirror

Zhou

Wang

et al. 2015

Appl. Opt.

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Conventional deformable mirrors (DM) cannot meet the requirement of aberration controlling for advanced lithography tools. This paper illustrates an approach using the property that deformation of a thin plate is similar to optical modes to realize a high fidelity multimode deformable mirror whose deformation has characteristics of optical aberration modes. The way to arrange actuators is also examined. In this paper, a 36-actuator deformable mirror is taken as an example to generate low-order Zernike modes. The result shows that this DM generates the fourth fringe Zernike mode (Z4) defocus, and primary aberration Z5-Z8 with an error less than 0.5%, generates the fifth-order aberration Z10-Z14, and generates the seventh-order aberration Z17-Z20 with an error less than 1.1%. The high fidelity replication of the Zernike mode indicates that the DM satisfies the demand of controlling aberrations corresponding to the first 20 Zernike modes in an advanced lithography tool.

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Section: B Dm In Lithography Lensmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

Concept and modeling analysis of a high fidelity multimode deformable mirror

Zhou

Wang

et al. 2015

Appl. Opt.

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Active compensation of wavefront aberrations by controllable heating of lens with electric film heater matrix

2016

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We present a new apparatus for active compensation of wavefront aberrations by controllable heating of a lens using a film heater matrix. The annular electric film heater matrix, comprising 24 individual heaters, is attached to the periphery of a lens. Utilizing the linear superposition, and wavefront change proportional to the heating energy properties induced by heating, a controllable wavefront can be defined by solving a linear function. The two properties of wavefront change of a lens have been confirmed through a specially designed experiment. The feasibility of the compensation method is validated by compensating the wavefront of a plate lens. The results show that the wavefront of the lens changes from 12.52 to 2.95 nm rms after compensation. With a more precise electric controlling board, better results could be achieved.

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Active lens for thermal aberration compensation in lithography lens

Zhao

Dong

et al. 2018

Appl. Opt.

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Aberration control for 70-nm optical lithography

Cited by 3 publications

References 0 publications

Concept and modeling analysis of a high fidelity multimode deformable mirror

Concept and modeling analysis of a high fidelity multimode deformable mirror

Active compensation of wavefront aberrations by controllable heating of lens with electric film heater matrix

Active lens for thermal aberration compensation in lithography lens

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