Aberration optimizing system using Zernike sensitivity method

Shimizu, Yasuo; Yamaguchi, Tadashi; Suzuki, Kyuma; Shiba, Yuji; Matsuyama, Tomoyuki; Hirukawa, Shigeru

doi:10.1117/12.485459

Cited by 4 publications

(4 citation statements)

References 2 publications

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“…This part analyze the relation between aberration of single refractive surface and the gas refractive index, to get the impact on geometrical aberration of the entire system. The aberration of single refractive surface is expressed by Seidel polynomial [3,4,5,6,7] : In a similar way, the impact of gas refractive index on curvature is analyzed. Firstly we discuss the property of a lens curvature.…”

Section: Impact On Geometrical Aberrationmentioning

confidence: 99%

Study of the impact of gas temperature and pressure on image quality of lithography objective lens

Zhou

Xing

2013

SPIE Proceedings

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The aim of present work is to estimate the impact of gas refractive index shift on the image quality of projection lens caused by the change of environment condition. This work in the paper consists of two parts: a)when temperature rises or reduces, how gas refractive index changes and the wave front error comes up; b)when gas pressure changes. The model objective lens developed for simulation is a US patent lens whose NA >1 and wave front RMS < 5nm in all fields. This paper includes an illustration of the impact of gas refractive index shift on optical system data, wave front, and aberration.According to the analysis, wave front RMS of projection lens will increase about 10nm if the temperature changed by 0.1K or the gas pressure by 100 Pa. Comparing to origin wave front RMS of the patent lens, 5nm, the change caused by gas temperature and pressure can't be neglected. It proves the necessary of compensating or controlling the optical path change resulted from gas refractive index shift during the lithography projection lens work process.

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Section: Impact On Geometrical Aberrationmentioning

confidence: 99%

Study of the impact of gas temperature and pressure on image quality of lithography objective lens

Zhou

Xing

2013

SPIE Proceedings

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“…The aberration adjustment system of a lithographic projection lens is a typical multiple-input multiple-output (MIMO) linear system, and its control model can be expressed as C MΦ. Here, the output C is the vector of all compensator setting values, the input Φ is the vector of the desired aberrations to be adjusted, and the control matrix M is used to calculate the setting vector C of the compensators during aberration adjustment [15][16][17].…”

Section: Introductionmentioning

confidence: 99%

In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method

et al. 2019

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Aberration adjustment is of great importance in the lithographic process of integrated circuit manufacturing due to the pressure variance, lens thermal effects, overlay correction, and 3D mask effects. With the objective of removing the crosstalk effect, as well as reducing computational complexity during in-line application, a dominant mode method is proposed to adjust the aberrations of the projection lens for a lithographic tool. Theoretical definitions and corresponding calculations of dominant modes are proposed to select the compensators of the projection lens and to build the control matrix for compensator settings. The proposed method is successfully applied in a practical aberration adjustment of the projection lens in a lithographic tool, and the results demonstrate its feasibility and performance.

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“…As the lens aberration can be tuned for each specific application (illumination setting and mask pattern layout) the imaging performance for each specific application can be optimized. References [1][2][3].…”

Section: Introductionmentioning

confidence: 99%

Application of aberration optimization for specific pattern using Nikon's TAO method

Meier¹,

Weirauch

Hoepfl³

et al. 2006

SPIE Proceedings

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A layer specific aberration control and optimization method is introduced with some field examples. For the first time lens tuning to application specific and product type mask features will be demonstrated. The adjusted lens set-up can be selected within the scanners process program, i.e. the exposure recipe, thus facilitating utmost flexibility. The application is using Nikon's TAO (Technology for Aberration Optimization) software method for specific pattern. Simulated imaging performance data using the Zernike sensitivity method is used as input. The optimization result is used for direct scanner lens element position change to reach a pre-calculated, well defined new wavefront signature. The new lens element position can be directly applied to the layer specific illumination setting via process program of the scanner tool. Specific imaging performance tolerances can be set. Several imaging parameters can be observed separately and various tolerances can be applied during software run, to reach optimized performance. In this paper two product type patterns, like lines and spaces and a dense hole array, and the way of optimization for a high NA 193nm scanner, like minimizing aberration offsets, will be shown. Special attention to the application at already very low aberration levels of a scanner lens is highlighted. Here the method shows the ability of further reduction of aberration specific CD effects in the field. Optimization targets, results, metrology interactions and possible limitations are discussed.

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Aberration optimizing system using Zernike sensitivity method

Cited by 4 publications

References 2 publications

Study of the impact of gas temperature and pressure on image quality of lithography objective lens

Study of the impact of gas temperature and pressure on image quality of lithography objective lens

In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method

Application of aberration optimization for specific pattern using Nikon's TAO method

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