Ablation of silica glass using pulsed laser plasma soft X-rays

Makimura, Tetsuya; Kenmotsu, Youichi; Miyamoto, Hisao; Niino, Hiroyuki; Murakami, Kouichi

doi:10.1016/j.susc.2005.06.067

Cited by 18 publications

(6 citation statements)

References 17 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Photo-etching of inorganic materials is also possible but requires higher EUV fluence in relation to polymers. Some experiments with photo-etching of inorganic materials, using laser-plasma radiation, were performed by Makimura et al [6]. They used Ta laser plasma to create pattern in a silica glass.…”

Section: Introductionmentioning

confidence: 99%

Micro- and Nanoprocessing of Polymers Using a Laser Plasma Extreme Ultraviolet Source

et al. 2010

View full text Add to dashboard Cite

Laser plasma with temperature of the order of tens eV can be an efficient source of extreme ultraviolet (EUV). The radiation can be focused using different kind of optics, giving sufficient fluence for some applications. In this work we present results of investigations concerning applications of a laser plasma EUV source based on a double stream gas puff target. The source was equipped with two different grazing incidence collectors. One of them was a multifoil collector, the second one was an axisymmetrical ellipsoidal collector. The multifoil mirror was used mainly in experiments concerning micromachining of organic polymers by direct photo-etching. The experiments were performed for different polymers that were irradiated through a fine metal grid as a contact mask. The smallest element of a pattern structure obtained in this way was 5 µm, while the structure height was 50 µm giving an aspect ratio about 10. The laser-plasma EUV source equipped with the axisymmetrical ellipsoidal collector was used for surface modification of organic polymers and inorganic solids. The surface morphology after irradiation was investigated. Different forms of micro-and nanostructures were obtained depending on material and irradiation conditions.

show abstract

Section: Introductionmentioning

confidence: 99%

Micro- and Nanoprocessing of Polymers Using a Laser Plasma Extreme Ultraviolet Source

et al. 2010

View full text Add to dashboard Cite

show abstract

“…48,55 . We found that transient light absorbing states are generated by LPSX irradiation of silica glass.…”

Section: Transient Absorption Induced In Silica Glassmentioning

confidence: 99%

Ablation of inorganic materials using laser plasma soft X-rays

et al. 2007

View full text Add to dashboard Cite

We have investigated ablation of inorganic materials using pulsed and focused soft X-rays. Soft X-rays in a range of 1-500 eV were produced by irradiation of Ta targets with Q-switched Nd:YAG laser light (532 nm, 0.5-0.8 J/pulse) with a pulse duration of 10 ns in a vacuum chamber. The soft X-rays were focused on the surfaces of inorganic materials using an ellipsoidal mirror at approximately 0.1 J/cm 2 . The ellipsoidal mirror is designed so as to focus soft X-rays at about 100 eV efficiently, while it can not reflect soft X-rays above 200 eV. We found that synthetic quartz glass, Pyrex, LiF, CaF 2 , Al 2 O 3 and LiNbO 3 , can be ablated by focused and pulsed soft X-rays. Typically, synthetic quartz glass is ablated at 50 nm/shot. We found that ablation occurs at X-ray fluences beyond the ablation threshold. Using a nano-scaled contact mask, trenches with a width of 50 nm and an aspect ratio of 1 are formed. The result indicates the diffusion length of absorbed energy during irradiation is less than 50 nm and that the accumulation results in ablation. The technique can also be applied to basic research of the interaction of intense soft X-rays with materials and resulting damage to the materials.

show abstract

“…The diffractive optics are different kinds of zone plates, mainly used for SXR or EUV microscopy [1][2][3]. For material processing, where relatively high fluence is necessary, mainly the reflective optics are used [4][5][6]. In this case depending on material properties, radiation wavelength range and fluence, material ablation or surface modification can occur [6 -8].…”

Section: Introductionmentioning

confidence: 99%

X-ray optics for laser-plasma sources: Aplications of intense SXR and EUV radiation pulses

Bartnik

Fiedorowicz

Jarocki³

et al. 2012

AIP Conference Proceedings

View full text Add to dashboard Cite

In this work we present a short review of SXR and EUV optics that have been designed and developed for experiments concerning material processing and imaging, using a laser-plasma radiation source based on a gas puff target. Three different kinds of mirrors employed as the EUV collectors are presented: the grazing incidence axisymmetrical ellipsoidal mirror, the grazing incidence multifoil mirror, and the ellipsoidal mirror with Mo/Si multilayer coating. Experiments concerning characterization of the mirrors were performed using EUV radiation from Kr or Xe plasmas produced in a double stream gas puff target irradiated with Nd:YAG laser pulses (4ns, 0.8 J, 10 Hz). Intensity of the focused radiation was sufficient for micromachining of organic polymers and surface modification of organic and inorganic solids. Different kinds of micro-and nanostructures created in near-surface layers of different kinds polymers were obtained. Significant differences were revealed in XPS spectra acquired for irradiated and not irradiated polymers.

show abstract

Ablation of silica glass using pulsed laser plasma soft X-rays

Cited by 18 publications

References 17 publications

Micro- and Nanoprocessing of Polymers Using a Laser Plasma Extreme Ultraviolet Source

Micro- and Nanoprocessing of Polymers Using a Laser Plasma Extreme Ultraviolet Source

Ablation of inorganic materials using laser plasma soft X-rays

X-ray optics for laser-plasma sources: Aplications of intense SXR and EUV radiation pulses

Contact Info

Product

Resources

About