2015
DOI: 10.1002/pip.2579
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Above 16% efficient sequentially grown Cu(In,Ga)(Se,S)2‐based solar cells with atomic layer deposited Zn(O,S) buffers

Abstract: We report the development of Cd-free buffers by atomic layer deposition for chalcopyrite-based solar cells. Zn(O,S) buffer layers were prepared by atomic layer deposition on sequentially grown Cu(In,Ga)(Se,S) 2 absorbers from Bosch Solar CISTech GmbH. An externally certified efficiency of 16.1% together with an open circuit voltage of 612 mV were achieved on laboratory scale devices. Stability tests show that the behavior of the ALD-Zn(O,S)-buffered devices can be characterized as stable only showing a minor d… Show more

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Cited by 25 publications
(20 citation statements)
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“…(i) A 60‐nm‐thick Zn(O,S) (9:1 cycle ratio of ZnO:ZnS corresponding to a [S]/([S] + [O]) of about 25%) buffer as well as a 130‐nm‐thick intrinsic ZnO (i‐ZnO) layer were deposited onto the absorber at 130 °C substrate temperature by atomic layer deposition (ALD) (Beneq TFS 500), see Refs. for details. The about 75‐nm‐thick i‐ZnO layer was deposited by ALD to avoid sputter damage to the subjacent Zn(O,S) buffer layer.…”
Section: Methodsmentioning
confidence: 99%
“…(i) A 60‐nm‐thick Zn(O,S) (9:1 cycle ratio of ZnO:ZnS corresponding to a [S]/([S] + [O]) of about 25%) buffer as well as a 130‐nm‐thick intrinsic ZnO (i‐ZnO) layer were deposited onto the absorber at 130 °C substrate temperature by atomic layer deposition (ALD) (Beneq TFS 500), see Refs. for details. The about 75‐nm‐thick i‐ZnO layer was deposited by ALD to avoid sputter damage to the subjacent Zn(O,S) buffer layer.…”
Section: Methodsmentioning
confidence: 99%
“…1) However, η is reaching close to the performance limit. Thin-film solar cells, such as CuInGaSe2, 2,3) CdTe, 4,5) and perovskite solar cells, 6,7) have also attracted much attention in studies to realize higher-η solar cells with lower cost. However, these materials consist of critical raw materials.…”
Section: Introductionmentioning
confidence: 99%
“…12 ZnOS then consists of stacked ZnO and ZnS layers where the S/(O + S) ratio is controlled by the number of ALD cycles used to deposit each binary layer. 3 Although the supercycle method enables a macroscopic control of film stoichiometry, microscopically it leads to out-of-plane compositional and structural nonuniformity. 13 An alternative approach to the supercycles has been proposed for the synthesis of multicomponent oxides by S-ALD, which consists of exposing an oxygen-terminated surface simultaneously to different metal-organic precursors.…”
Section: A Layer Deposition and Characterizationmentioning
confidence: 99%
“…2 Atomic layer deposition (ALD) is often used for the synthesis of Zn-based buffer layers, due to its ability to control the film composition at the atomic level and superior uniformity over nonplanar, large-area substrates with 3D topology. 3 The low deposition rate (∼0.01 nm/s) of conventional ALD can hinder the use of this technique in the solar cell industry where high throughput is needed to achieve low production costs. This drawback has been overcome by the spatial-ALD (S-ALD) technique.…”
Section: Introductionmentioning
confidence: 99%