The broadband UV (230-420 nm) photoinduced chemistry of CH 3 Br adsorbed on Cu(2ML)/Ru(001) in the coverage range of 1-50 ML was studied by monitoring the desorption products (∆p-TPD mode) in combination with post irradiation work function change measurements before and during surface heating (∆ -ΤPD mode). ∆ measurements enabled us to follow multilayer restructure and desorption of parent molecules and photochemical reaction products in the temperature range of 80-700 K. Methyl radicals accumulated on the surface are the precursor for the thermal formation of methane and ethylene at 450 K. Dehydrogenation of the methyl group is the rate-limiting step of the surface reaction resulting in the formation of these molecules. Based on work function change measurements, an estimate of the adsorbed methyl dipole moment is µ 0 ) 0.48 D. Dissociative electron attachment (DEA) driven CH 3 Br dissociation produced CH 3 and CH 2 fragments within the parent molecules multilayer matrix. At the multilayer coverage range, ∆ increases by up to 1.1 eV after 10 min UV irradiation. Model calculations qualitatively describe the post irradiation work function changes induced by the embedded photofragments (mostly Br -ions) inside the CH 3 Br dielectric film.Comparison of the ∆ -TPD spectra on Cu(2ML)/Ru(001) to those on clean Ru(001) indicates that the nature of the molecule-surface interaction and the structure of the first few layers strongly influence the resulting photochemistry at layer thickness up to at least 20 ML.