Absolute density measurement of hydrogen atom in inductively coupled Ar/H2 plasmas using vacuum ultraviolet absorption spectroscopy

Cho, Deog Gyun; Han, Jonggu; Han, Duksun; Moon, Se Youn

doi:10.1016/j.cap.2020.02.001

Cited by 7 publications

(2 citation statements)

References 19 publications

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“…Interestingly, the intensity reduction rates by MgF 2 (I 115 /I 350 ) and by UV-fused silica (I 250 /I 350 ) are almost constant for various input power levels, as reported in figure 5(b), meaning that the intensity changes in different wavelength regions are similar for different powers. Since a higher power could increase the electron density but not significantly change the electron temperature related to the electron impact excitation energy levels, the intensity ratio between different wavelengths is almost the same for various powers [24]. To find the dominant VUV radiation sources, the selective wavelength regions of the VUV emission are calculated from figure 5 as seen in figure 4(a).…”

Section: Vuv Characteristics Of Hydrogen Plasmamentioning

confidence: 99%

Real-time VUV radiation monitoring in low-pressure hydrogen plasma based on fluorescence of sodium salicylate

Han¹,

Park²,

Mauchauffé³

et al. 2022

Meas. Sci. Technol.

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Recently, vacuum ultra-violet (VUV) radiations emitted from plasmas have been of particular interest for semiconductor device fabrication because of the effects of their high energy photons such as induced damage or curing on low-k materials. Due to the difficulty to implement conventional spectroscopic methods to monitor VUV radiation with high accuracy and time resolution in current plasma processing equipment, novel monitoring methods must be investigated. Therefore, in this work, we developed a compact VUV radiation monitoring system based on a scintillator, i.e. sodium salicylate (NaSal), for real-time VUV measurements. Compared to conventional VUV spectrometer, the system shows considerable implementation potential thanks to its compact size, higher detection accuracy and time resolution below 200 ns. VUV radiations emitted by continuous and pulsed hydrogen plasmas generated at low pressure were investigated using the developed system. Using various filters, we were able to compare the VUV photons intensity in different wavelength ranges. It was found that VUV photons intensity between 115 and 250 nm was about 2.5 times higher than in the region below 115 nm due to intense Lyman-α and molecular radiations such as Lyman and Werner bands observed in low-pressure hydrogen plasmas.

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Section: Vuv Characteristics Of Hydrogen Plasmamentioning

confidence: 99%

Real-time VUV radiation monitoring in low-pressure hydrogen plasma based on fluorescence of sodium salicylate

Han¹,

Park²,

Mauchauffé³

et al. 2022

Meas. Sci. Technol.

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“…The two most common methods for producing thermal plasma are direct current (DC) arc discharge and inductively coupled discharge [1][2][3][4][5][6]. The inductively coupled plasma (ICP) torch ionizes the working gas flowing through the quartz tube using high-frequency induction heating.…”

Section: Introductionmentioning

confidence: 99%

The Effect of Power on Inductively Coupled Plasma Parameters

Marza

Khalaf

2022

IJP

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In this work, we studied the effect of power variation on inductively coupled plasma parameters using numerical simulation. Different values were used for input power (750 W-1500 W), gas temperature 300K, gas pressure (0.02torr), 5 tourns of the copper coil and the plasma was produced at radio frequency (RF) 13.56 MHZ on the coil above the quartz chamber. For the previous purpose, a computer simulation in two dimensions axisymmetric, based on finite element method, was implemented for argon plasma. Based on the results we were able to obtain plasma with a higher density, which was represented by obtaining the plasma parameters (electron density, electric potential, total power, number density of argon ions, electron temperature, number density of excited argon atoms) where the high density in the generated plasma provides a greater degree in material processing, which increases the efficiency of the system. These results may aid in future research towards the development of more efficient optimization of plasma parameters which are (electron density, electric potential, total power, number density of argon ions, electron temperature, and number density of excited argon atoms).

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Effects of induction coil parameters of plasma torch on the distribution of temperature and flow fields

Deng

Zhang

et al. 2021

Alexandria Engineering Journal

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Absolute density measurement of hydrogen atom in inductively coupled Ar/H2 plasmas using vacuum ultraviolet absorption spectroscopy

Cited by 7 publications

References 19 publications

Real-time VUV radiation monitoring in low-pressure hydrogen plasma based on fluorescence of sodium salicylate

Real-time VUV radiation monitoring in low-pressure hydrogen plasma based on fluorescence of sodium salicylate

The Effect of Power on Inductively Coupled Plasma Parameters

Effects of induction coil parameters of plasma torch on the distribution of temperature and flow fields

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