Wet removal of nitric oxide (NO) from simulated flue gas by an ultraviolet (UV)/H 2 O 2 advanced oxidation process was studied in a semi-continuous and small-scale UV-bubble column reactor. The effects of the H 2 O 2 concentration, UV radiation intensity, gas flow, and liquid layer height on NO removal efficiencies were studied. The results showed that an increase in the H 2 O 2 concentration, UV radiation intensity, or liquid layer height could enhance NO removal. The NO removal was inhibited by an increase of the gas flow. The ion products in solution were measured with ion chromatography, and a mass balance for the nitrogen element in NO from simulated flue gas was calculated. Potential effects of solution pH change and ion products in solution were also discussed.