1976
DOI: 10.1116/1.568815
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Abstract: Plasma etching of thin metal and dielectric films

Abstract: Articles you may be interested inEtching of thin metal films using a ballistic model J. Vac. Sci. Technol. A 10, 912 (1992); 10.1116/1.577694 Summary Abstract: Plasmaenhanced beam deposition of thin dielectric films Abstract: Etching in reactive plasmas

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