Accelerated C-face polishing of silicon carbide by alkaline polishing slurries with Fe3O4 catalysts

Wang, Xuehan; Chen, Jiapeng; Bu, Zhengzheng; Wang, Hanqiang; Wang, Wenjun; Liu, Weimin; Sun, Tao

doi:10.1016/j.jece.2021.106863

Cited by 22 publications

(8 citation statements)

References 31 publications

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“…The redox cycling of iron could occur with the help of ·OH and HO 2 · (eqn (9) and (10)). 54,55 Then, ·OH would react with nickel complexes by degradation and network breaking to release Ni 2+ (eqn (11)). Finally, Ni 2+ entered the crystal lattice of Fe 3 O 4 and substituted Fe 2+ to form NiFe 2 O 4 .[EDTA–Ni] 2− + OH − → [EDTA–Ni–OH] 3− (C 3 H 5 O 3 ) 2 Ni + 3OH − → 2[C 3 H 5 O 3 ] − + Ni(OH) 3 − O 2 → 2O·O· + H 2 O → 2·OHH 2 O → H· + ·OHH· + O 2 → HO 2 ·Fe 2+ + O· + H 2 O → Fe 3+ + ·OH + OH − Fe 3+ + O· + H 2 O → Fe 2+ + HO 2 · + H + Fe 2+ + ·OH → Fe 3+ + OH − Fe 3+ + HO 2 · → Fe 2+ + O 2 + H + ·OH + Ni 2+ -complex → Ni 2+ + degrade product + H 2 O…”

Section: Resultsmentioning

confidence: 99%

High-efficiency nickel recovery from spent electroless nickel plating solution: effective degradation of high-concentration nickel complexes to form a nickel ferrite nanomaterial via Fe₃O₄ catalytic oxidation

Lu,

Qin,

et al. 2024

Environ. Sci.: Nano

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Section: Resultsmentioning

confidence: 99%

High-efficiency nickel recovery from spent electroless nickel plating solution: effective degradation of high-concentration nickel complexes to form a nickel ferrite nanomaterial via Fe₃O₄ catalytic oxidation

Lu,

Qin,

et al. 2024

Environ. Sci.: Nano

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“…These hydroxyl radicals effectively break the C-Si bonds on the SiC surface, leading to the formation of an oxide layer [24][25][26], as described in Eq. (1) up to (3).…”

Section: Mechanism Of Electrophoretic Assisted-multi-diamond Wire Sawingmentioning

confidence: 99%

Assessment of Sustainable and Machinable Performance Metrics of Monocrystalline Silicon Carbide Wafer with Electrophoretic Assisted Multi-Diamond Wire Sawing

Sefene,

Chen,

Tsai

et al. 2024

Preprint

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The rapacious demand for energy in semiconductor wafer manufacturing industries has significant implications for global warming and wafer manufacturing costs. Assessing sustainability in the multi-diamond wire sawing (MDWS) process is crucial for reducing costs and mitigating environmental impacts. However, sustainability assessment integrated with machinability performance metrics in this process has not been investigated. This novel study extensively analyzes sustainability metrics such as processing time, energy consumption, carbon dioxide emission, machining cost, and machinability characteristics, including surface roughness, diamond wear rate, and sawing temperature in monocrystalline silicon carbide (mono-SiC) sawing process. Experiments were conducted using traditional MDWS (T-MDWS), reactive MDWS (R-MDWS), and electrophoretic-assisted reactive MDWS (ER-MDWS) coolants. An autoregressive integrated moving average (ARIMA) model were used to predict the overall energy consumption of the MDWS machine. Results showed significant improvements across various responses such as processing time, energy consumption, carbon dioxide emissions, machining cost, surface roughness, diamond wear rate, and sawing temperature, with reductions of 2.95%, 3.87%, 6.80%, 12.82%, 4.68%, 16.32%, and 4.39%, respectively. Furthermore, the ARIMA model results indicate that the total energy consumption prediction accuracy reaches 98.813%. The findings demonstrated that the ER-MDWS cooling strategy is well-suited for large-scale wafer production without compromising surface quality while minimizing environmental impact.

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“…Under a neutral polishing solution, it is challenging for the solid-phase catalyst to ionize free Fe 2+ and Fe 3+ , the number of active sites on the surface is minimal and the chemistry is weak, resulting in an unfavorable polishing process. The homogeneous Fenton reaction of Fe 3 O 4 is limited in an alkaline polishing solution [32], and the polishing effect is unsatisfactory. The contributions of the surface Fenton reaction and homogeneous Fenton reaction of the solid-phase catalyst Fe 3 O 4 to material removal require further investigation.…”

Section: Effect Of Ph On Polishing Effectmentioning

confidence: 99%

Study on heterogeneous Fenton reaction parameters for polishing single-crystal SiC using magnetorheological elastomers polishing pads

Hu¹,

Li²,

Lu³

et al. 2022

Smart Mater. Struct.

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Magnetorheological elastomers (MRE) are intelligent controllable materials used as polishing pads in chemical mechanical polishing (CMP), and the magnetic particles in the MRE polishing pad are used as solid-phase catalysts for heterogeneous Fenton reactions for oxidizing single-crystal SiC surfaces, thereby helping reduce the processing difficulty and obtain high-quality surfaces. The influence of the solid-phase catalyst (Fe3O4 mass fraction, particle size) and polishing solution environment (H2O2 concentration, pH value) on the CMP heterogeneous Fenton reaction polishing single-crystal SiC were investigated. The material removal behavior of the MRE polishing pad was investigated. The results demonstrated that the solid-phase catalyst, Fe3O4, has a better superior effect than the carbonyl iron powder (CIP). The polishing material removal rate (MRR) increased and the surface roughness (Ra) decreased with an increase in the Fe3O4 mass fraction. Superior polishing results were obtained at a particle size of 0.3 μm. The higher the H2O2 concentration in the polishing solution, the greater the MRR, with lower Ra at 10% concentration. The highest MRR and lowest Ra were achieved at pH = 3 in acidic environments. During polishing, the heterogeneous Fenton reaction can significantly enhance the removal ability of polishing materials. The MRR increased by 33.4% with the heterogeneous Fenton reaction compared with those without the heterogeneous Fenton reaction, and the contribution of the heterogeneous Fenton reaction to total material removal was 25.03%. The analysis of the SiC–Abrasive–MRE polishing pad contact state revealed that the heterogeneous Fenton reaction can oxidize the SiC surface and reduce the surface hardness, increasing the indentation depth δwa of the abrasive grain into the SiC surface and exhibiting greater material removal.

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Accelerated C-face polishing of silicon carbide by alkaline polishing slurries with Fe3O4 catalysts

Cited by 22 publications

References 31 publications

High-efficiency nickel recovery from spent electroless nickel plating solution: effective degradation of high-concentration nickel complexes to form a nickel ferrite nanomaterial via Fe₃O₄ catalytic oxidation

High-efficiency nickel recovery from spent electroless nickel plating solution: effective degradation of high-concentration nickel complexes to form a nickel ferrite nanomaterial via Fe₃O₄ catalytic oxidation

Assessment of Sustainable and Machinable Performance Metrics of Monocrystalline Silicon Carbide Wafer with Electrophoretic Assisted Multi-Diamond Wire Sawing

Study on heterogeneous Fenton reaction parameters for polishing single-crystal SiC using magnetorheological elastomers polishing pads

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Accelerated C-face polishing of silicon carbide by alkaline polishing slurries with Fe3O4 catalysts

Cited by 22 publications

References 31 publications

High-efficiency nickel recovery from spent electroless nickel plating solution: effective degradation of high-concentration nickel complexes to form a nickel ferrite nanomaterial via Fe3O4 catalytic oxidation

High-efficiency nickel recovery from spent electroless nickel plating solution: effective degradation of high-concentration nickel complexes to form a nickel ferrite nanomaterial via Fe3O4 catalytic oxidation

Assessment of Sustainable and Machinable Performance Metrics of Monocrystalline Silicon Carbide Wafer with Electrophoretic Assisted Multi-Diamond Wire Sawing

Study on heterogeneous Fenton reaction parameters for polishing single-crystal SiC using magnetorheological elastomers polishing pads

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High-efficiency nickel recovery from spent electroless nickel plating solution: effective degradation of high-concentration nickel complexes to form a nickel ferrite nanomaterial via Fe₃O₄ catalytic oxidation

High-efficiency nickel recovery from spent electroless nickel plating solution: effective degradation of high-concentration nickel complexes to form a nickel ferrite nanomaterial via Fe₃O₄ catalytic oxidation