2015
DOI: 10.1002/pssr.201510064
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Accelerated formation of the boron–oxygen complex in p‐type Czochralski silicon

Abstract: This Letter reports on the acceleration of the rate of formation of the boron–oxygen defect in p‐type Czochralski silicon with illumination intensities in excess of 2.1 × 1017 photons/cm2/s. It is observed that increased light intensities greatly enhance the rate of defect formation, without increasing the saturation concentration of the defect. These results suggest a dependence of the defect formation rate upon the total majority carrier concentration. Finally, a method using temperatures up to 475 K and an … Show more

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Cited by 35 publications
(26 citation statements)
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“…formation and passivation appears to be similar to that recently shown for the BO defect in Cz silicon [12] in the sense that the defect must be formed prior to passivation, and that increased illumination and elevated temperatures can be used to accelerate the degradation. However, in the case of mc-Si, the timescales are substantially increased.…”
mentioning
confidence: 54%
“…formation and passivation appears to be similar to that recently shown for the BO defect in Cz silicon [12] in the sense that the defect must be formed prior to passivation, and that increased illumination and elevated temperatures can be used to accelerate the degradation. However, in the case of mc-Si, the timescales are substantially increased.…”
mentioning
confidence: 54%
“…[113] An example showing the impact of advanced hydrogenation processes for eliminating B-O-related degradation is shown in Table 2. The cells that received an AHP process to eliminate B-O-related carrier-induced degradation show a higher efficiency (20.54 %) after the AHP and subsequent accelerated stability test [98] compared with the initial efficiency (20.11 %). This increase was related to significant increases in the V OC and short circuit current (J SC ) of the devices, indicating the passivation of additional defects in the device.…”
Section: Hydrogenation Of Carrier-induced Defectsmentioning
confidence: 97%
“…In 2009, Münzer identified a critical role of hydrogen during illuminated annealing, whereby the permanent deactivation only occurred in solar cells fabricated using hydrogen-rich SiN x :H grown by PECVD, and not those using hydrogen-lean SiN x :H grown by low-pressure chemical vapour deposition (LPCVD). [32] Further work by multiple authors has highlighted the influence of the hydrogen concentration and thickness of dielectric layers in the passivation, [16,96,97] the dependence of the passivation rate on the illumination intensity (separately from the role for defect formation [95,98] ), and the correlation between the passivation rate and the theoretical concentration of H 0 . [31,33,60,99,100] The importance of illuminated annealing has also been noted for a more recently identified degradation mechanism.…”
Section: Hydrogenation Of Carrier-induced Defectsmentioning
confidence: 99%
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“…Above such excess electron concentrations, the reaction rate in p-type silicon is determined by the background boron-doping concentration, typically on the order of 1 × 10 16 cm −3 . However, Hamer et al demonstrated that this fundamental limit of the defect formation rate imposed by the background doping concentration could be overcome by driving the silicon into high-injection conditions using high-intensity laser illumination [131]. It was proposed that the increased reaction rate with high-intensity illumination could be due to a dependence of the reaction rate on the total hole concentration, rather than the equilibrium hole concentration.…”
Section: Role Of Defect Formationmentioning
confidence: 99%