2023
DOI: 10.1149/1945-7111/ad0a74
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Acceleration Mechanism of Triethanolamine in Electroless Bath for Pure Cobalt Deposition

Yu Shen,
Jiayi Guo,
Lu Wang
et al.

Abstract: The utilization of hydrazine as a reducing agent in the electroless cobalt bath is indispensable for the application of pure cobalt film fabrication in ultra-large-scale integration (ULSI). However, the deposition rate using the ordinary coating bath is relatively low. After conducting numerous experiments in this study, we have made a groundbreaking discovery: the deposition rate of electroless plating pure cobalt bath can be significantly increased from less than 1.0 μ·h-1 to more than 5.0 μ·h-1 by adding tr… Show more

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