Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

Liang, Gaofeng; Chen, Xi; Zhao, Qing; Guo, L. Jay

doi:10.1515/nanoph-2017-0028

Cited by 35 publications

(35 citation statements)

References 43 publications

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“…Additionally, spatial filtering has been shown to reduce the line edge roughness of photolithographic exposures in the presence of surface roughness. 65 Therefore, one natural extension of our work would be the studying of these intriguing high-resolution imaging systems from the ACI method perspective to not only experimentally confirm our theoretical predictions but also improve their performances. The actual transmission properties of the filter may not exactly replicate P (k) from eq 6, but the important property is the ability to selectively amplify a band of high spatial frequencies relative to the spatial frequencies in the original passband of the superlens.…”

Section: Resultsmentioning

confidence: 69%

Plasmonic Superlens Imaging Enhanced by Incoherent Active Convolved Illumination

2018

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We introduce a loss compensation method to increase the resolution of near-field imaging with a plasmonic superlens that relies on the convolution of a high spatial frequency passband function with the object. Implementation with incoherent light removes the need for phase information. The method is described theoretically and numerical imaging results with artificial noise are presented, which display enhanced resolution of a few tens of nanometers, or around one-fifteenth of the free space wavelength. A physical implementation of the method is designed and simulated to provide a proof-of-principle, and steps toward experimental implementation are discussed.The theory and experimental demonstration of metamaterials has inspired interesting avenues of imaging, 1-12 lithography, 13,14 and beam generation 15 beyond the diffraction limit, particularly motivated by the prospect of a perfect lens. 16 Researchers have quickly realized arXiv:1801.06583v1 [physics.optics]

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Section: Resultsmentioning

confidence: 69%

Plasmonic Superlens Imaging Enhanced by Incoherent Active Convolved Illumination

2018

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“…Mitigation requires ultrasmooth interfaces, down to atomic‐scale smoothness if line‐edge roughness below 5 nm is to be achieved. Recent work has also shown that the use of multilayer metallodielectric superlens systems (also referred to as hyperbolic metamaterial (HMM) superlenses, see below) can mitigate the line edge roughness effects in plasmonic superlens imaging due to the selective filtering of the broad spatial frequencies of the hotspot generated fields from the narrow frequency band of the image. This offers an exciting new route for exploring practical superlens applications, provided that means of fabricating the HMM layers with acceptable tolerances of thickness and smoothness can be developed.…”

Section: Plasmonic Superlens Imaging and Lithographymentioning

confidence: 99%

“…Comparisons between hyper‐ and superlens lithography showed more robustness of the HMM to surface roughness and defects on the masks due to spatial frequency filtering effect . Liang et al simulated field distribution of super‐ and hyperlens lithography with consideration of surface roughness and mask defects as demonstrated in Figure . Hyperbolic metamaterials are capable of achieving more uniform patterning results and are more resilient to mask defects than the single layer superlenses.…”

Section: Hyperbolic Metal‐dielectric Multilayersmentioning

confidence: 99%

“…Comparisons of: a,c) field profiles (cross‐section and in resist) of superlens lithography; b,d) are field profiles of hyperlens lithography; e) superlens lithography affected severely by mask defects; f) hyperlens immunity to some degree of the defects. Reproduced under a Creative Commons 4.0 licence . Copyright 2018, De Gruyter.…”

Section: Hyperbolic Metal‐dielectric Multilayersmentioning

confidence: 99%

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Plasmonic Lithography: Recent Progress

Hong

Blaikie

2019

Advanced Optical Materials

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Plasmonic lithography has received extensive attention as both a potential candidate for next generation lithography and as an interesting testbed to test the fundamental resolution limits of optical imaging and patterning. Owing to the utilization of the otherwise lost evanescent near fields containing high frequency information, surface plasmon-based lithographic techniques can break the diffraction limit in conventional photolithography; resolution down to approximately 20 nm using visible light has been experimentally demonstrated, and theoretical studies have analyzed methods that have the potential for creating nanopatterns with sub-10 nm resolution. This paper reviews the research progress and various modalities of plasmonic lithography, addresses current obstacles and problems, and provides an outlook for practical application.

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“…Compared with other optical metamaterials, like chiral and split ring resonator–based metamaterials, HMMs have advantages of relative ease of fabrication at optical frequencies, broadband nonresonant and 3D bulk responses, and flexible wavelength tunability. As a result, HMMs have attracted widespread interest and become a good multifunctional platform for many exotic applications, such as optical negative refraction and light beam steering, subdiffraction‐limited imaging and nanolithography, spontaneous and thermal emission engineering, ultrasensitive optical, biological, and chemical sensing, omnidirectional and broadband optical absorption …”

Section: Introductionmentioning

confidence: 99%

Hyperbolic Metamaterials and Metasurfaces: Fundamentals and Applications

Huo

Zhang

Liang

et al. 2019

Advanced Optical Materials

171

107

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and their potential applications in various fields, including optical waveguiding, imaging, ultrasensitive optical sensing, and electromagnetic cloaking.Among the different types of optical metamaterials proposed and demonstrated to date, there is one class of highly anisotropic metamaterials which exhibit hyperbolic (or indefinite) dispersions, depending on their effective electric tensors (here, we only consider nonmagnetic media with unit magnetic tensors). Such hyperbolic metamaterials (HMMs) have reached the ultra-anisotropic limit of traditional uniaxial crystal and lead to dramatic changes for the light propagation behaviors. [12][13][14][15][16] Compared with other optical metamaterials, like chiral [17,18] and split ring resonator-based metamaterials, [19,20] HMMs have advantages of relative ease of fabrication at optical frequencies, broadband nonresonant and 3D bulk responses, and flexible wavelength tunability. As a result, HMMs have attracted widespread interest and become a good multifunctional platform for many exotic applications, such as optical negative refraction and light beam steering, [12,[21][22][23][24][25][26][27][28] subdiffraction-limited imaging and nanolithography, [29][30][31][32][33][34][35][36][37][38][39][40][41][42][43][44][45] spontaneous and thermal emission engineering, [71][72][73][74][75][76][77][78][79][80] ultrasensitive optical, biological, and chemical sensing, [81][82][83][84][85][86][87][88][89] omnidirectional and broadband optical absorption. [90][91][92][93] On the other hand, ultrathin metasurfaces, which comprise a class of planar optical metamaterials with many subwavelength structural units, have attracted much attention due to their ability of locally controlling the phase, amplitude, and polarization of light at the interface between two natural materials. [94][95][96][97] 2D planar metasurfaces have many advantages over bulk metamaterials, including simplifying the fabrication and integration process, reducing energy loss, and being compatible with other photonics devices. In this context, as an efficient surface wave modulation platform, hyperbolic metasurfaces (HMSs) with in-plane hyperbolic dispersions have a potential influence on the development of on-chip planar photonic devices. [95,98] In this review, we first discuss the dispersions and realizations of hyperbolic media. Then, we review the recent achievements of various optical applications based on 3D bulk HMMs and 2D planar HMSs. It should be stressed that, although some application scenarios for 3D HMMs and 2D HMSs are analogous, in fact they are not equal to each other because additional constrains will be introduced on the surface wave as the dimensionality degraded, which is accompanied by fancy in-plane Recent advances in nanofabrication and characterization technologies have spurred many breakthroughs in the field of optical metamaterials and metasurfaces that provide novel ways of manipulating light interaction in a well controllable manner. Among these artificial nanostructured materials, ...

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Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

Cited by 35 publications

References 43 publications

Plasmonic Superlens Imaging Enhanced by Incoherent Active Convolved Illumination

Plasmonic Superlens Imaging Enhanced by Incoherent Active Convolved Illumination

Plasmonic Lithography: Recent Progress

Hyperbolic Metamaterials and Metasurfaces: Fundamentals and Applications

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