2021
DOI: 10.1021/acs.langmuir.1c00518
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Achieving Stable Patterns in Multicomponent Polymer Thin Films Using Marangoni and van der Waals Forces

Abstract: Liquid−air interfaces can be deformed by surfacetension gradients to create topography, a phenomenon useful for polymer film patterning. A recently developed method creates these gradients by photochemically patterning a solid polymer film. Heating the film to the liquid state leads to flow driven by the patterned surface-tension gradients, but capillary leveling and diffusion of surface-active species facilitate eventual dissipation of the topography. However, experiments demonstrate that using blends of high… Show more

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Cited by 5 publications
(11 citation statements)
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“…One reason for the slight discrepancy between model predictions and experiments is likely due to differences between the estimated values of physical constants and their actual values. In addition, the model does not incorporate the effect of any chemical imperfections at the polymer/air interface and neglects van der Waals interactions in the film, which play a critical role in the dynamics of ultrathin liquid films (thicknesses below ∼100 nm). , …”
Section: Resultsmentioning
confidence: 99%
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“…One reason for the slight discrepancy between model predictions and experiments is likely due to differences between the estimated values of physical constants and their actual values. In addition, the model does not incorporate the effect of any chemical imperfections at the polymer/air interface and neglects van der Waals interactions in the film, which play a critical role in the dynamics of ultrathin liquid films (thicknesses below ∼100 nm). , …”
Section: Resultsmentioning
confidence: 99%
“…However, as the film thins down close to the substrate, van der Waals interactions become significant . Attractive van der Waals interactions in multicomponent PMP can act against the feature-dissipative mechanisms, effectively locking in features for very long times . Incorporating disjoining pressure in the model for single-component PMP could illuminate the effect of various substrates (including heterogeneous ones) on the patterning process and provide insight into how to further enhance feature aspect ratios.…”
Section: Discussionmentioning
confidence: 99%
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