2017
DOI: 10.1016/j.dyepig.2017.06.059
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Achieving tunable memory performance from nonvolatile to volatile by altering the trap depth of charge trapping sites in functional imides containing carbazole moieties

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Cited by 11 publications
(6 citation statements)
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“…The amorphous characteristic also made PIs as one of the ideal material for producing high quality thin films. 36,37 Meanwhile, the storage device could be prepared by conventional spin coating process. 12,32
Figure 5.The wide-angle X-ray diffraction patterns.
…”
Section: Resultsmentioning
confidence: 99%
“…The amorphous characteristic also made PIs as one of the ideal material for producing high quality thin films. 36,37 Meanwhile, the storage device could be prepared by conventional spin coating process. 12,32
Figure 5.The wide-angle X-ray diffraction patterns.
…”
Section: Resultsmentioning
confidence: 99%
“…This result is consistent with their excellent organo‐solubility. The amorphous characteristic also made PIs possess excellent film‐formation ability; thus, the memory device could be fabricated through convenient and conventional spin‐coating process …”
Section: Resultsmentioning
confidence: 99%
“…The electron-withdrawing group's strength matches with the traps' depth. 59 In compound 4d, the trap depths of the imidazole and nitro groups are 0.48 and 2.89 eV, respectively, including imidazole, −NO 2 , −F, and −CF 3 , which can act as a trap in negative ESP. These trapping centers can be stabilized in the excited state via intra/intermolecular charge transfer and impede the mobility of moving charge carriers.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%