2017
DOI: 10.1038/s41598-017-01099-3
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Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment

Abstract: Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the aperture of the collimating lenses. Here we propose broad-beam scanning exposure which employs the latent grating generated continuously during scanning for real-time dynamic fringe locking and thus achieves unlimited record… Show more

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Cited by 11 publications
(3 citation statements)
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“…2(a) . By varying the incidence angle, that is, the angle between the light incident on the electrode surface and the line perpendicular to the surface, the diameters of the PR nanoholes could be freely varied without the use of a photomask 31 , 38 45 . The PR nanohole patterns on the ITO substrate were then used as templates to deposit gold via ECD.…”
Section: Resultsmentioning
confidence: 99%
“…2(a) . By varying the incidence angle, that is, the angle between the light incident on the electrode surface and the line perpendicular to the surface, the diameters of the PR nanoholes could be freely varied without the use of a photomask 31 , 38 45 . The PR nanohole patterns on the ITO substrate were then used as templates to deposit gold via ECD.…”
Section: Resultsmentioning
confidence: 99%
“…There are two major types of optical configuration for the laser interference lithography: the one is referred to as the division of amplitude system [59,125,126,127,128,129]. Figure 19a shows an optical setup of the phase-shift laser interference lithography [59], which is a kind of division of amplitude system.…”
Section: Fabrication and Verification Of Scale Gratingmentioning
confidence: 99%
“…Meanwhile, the optical setup based on the two-beam interference lithography tends to become complicated and weak against external disturbances due to the long optical paths of the sub-beams. Some methods have been proposed so far to overcome the problem [127,128,129]. For example, the angular motion errors θ X and θ Z of the substrate about the X and Z -axes, respectively, will affect the profile uniformity of the pattern structures as well as the grating pitch.…”
Section: Fabrication and Verification Of Scale Gratingmentioning
confidence: 99%