Actinic pattern mask inspection for high-NA EUV lithography

Todoroki, Toshiyuki; Gondaira, Ko; Goonesekera, Arosha; Miyai, Hiroki

doi:10.1117/12.2686350

Cited by 2 publications

(2 citation statements)

References 10 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Lasertec's in-house EUV light source, URASHIMA, is designed specifically for use on actinic mask inspection tools [14][15][16] . It is a high-brightness EUV light source with an optimal etendue size for inspection.…”

Section: Euv Light Source For Apmimentioning

confidence: 99%

See 1 more Smart Citation

Actinic patterned mask inspection for high-NA EUV lithography

Gondaira,

Todoroki,

Nishizawa

et al. 2024

Optical and EUV Nanolithography XXXVII

View full text Add to dashboard Cite

Lasertec released an actinic patterned mask inspection (APMI) system named ACTIS in 2019 and has since been providing it as an EUV mask inspection solution for use at mask shops and semiconductor fabs in high-volume manufacturing. Actinic inspection is a type of inspection that utilizes 13.5nm EUV, the wavelength of light used in EUV lithography. ACTIS performs high-resolution, high-throughput inspection of EUV masks and detects mask defects that print on wafers in the lithography process (printable defects). One of the key advantages offered by APMI is its ability to perform highresolution through-pellicle inspection. EUV pellicles are expected to be used in semiconductor fabs, and ACTIS can detect printable defects on EUV masks even when a pellicle is attached to them.High-NA EUV lithography will be used at the technology nodes of N2 and beyond. The projection optics of high-NA EUV lithography are anamorphic optics, which have different scales of magnification for the horizontal and vertical axes. Lasertec has developed a next-generation model of ACTIS for high-NA mask inspection. It uses higher NA objective optics to meet the requirements of high-NA EUV mask inspection.This paper discusses the next-generation ACTIS for high-NA EUV lithography and its inspection performance on programmed defect masks that are similar to actual production masks. The paper also discusses the characteristics of a light source and illumination optics required for APMI.

show abstract

Section: Euv Light Source For Apmimentioning

confidence: 99%

“…Lasertec has developed the ACTIS A300 series, a new model of ACTIS for high-NA EUV lithography 14,20 . The objective optics have been upgraded to high-NA.…”

Section: Apmi For High-na Euv Lithography Mask Inspection For High-na...mentioning

confidence: 99%