1993
DOI: 10.1007/bf01574916
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Active two-terminal devices as local oscillators for low-noise receiver systems at submillimeter wave frequencies

Abstract: The power capabilities of three different two-terminal devices, GaAs IMPATT diodes, inP Gunn devices and GaAs TUNNETT diodes are evaluated. Two different selective etching technologies have been employed to fabricate devices on either a diamond heat sink or an integral heat sink. The reported RF power levels in fundamental mode are 20 mW at 120 GHz and 15 mW at 135 GHz for D-band GaAs IMPATT diodes, 21 mW at 120 GHz, 17 mW at 133 GHz and 8 mW at 155 GHz for D-band InP Gunn devices and up to 35 mW around 103 GH… Show more

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Cited by 8 publications
(3 citation statements)
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“…Figure 2 shows a scanning electron microscope (SEM) photograph of the fabricated GaAs Gunn diodes. 7,8)…”
Section: Device Fabricationmentioning
confidence: 99%
“…Figure 2 shows a scanning electron microscope (SEM) photograph of the fabricated GaAs Gunn diodes. 7,8)…”
Section: Device Fabricationmentioning
confidence: 99%
“…The layers were, in order of growth, a 1.5 pim-thick n+ InP buffer layer doped at 1 x 1018 cm-3, the active layer of 1.8 pim of InP doped at 1.1 x 1016 cm-3. The diodes with nn+ structure exhibit much lower current density, higher output power, and superior frequency stability with temperature variation than the conventional n+nn+ structure [10]. The common fabrication procedure of the InP Gunn diode was shown in Fig.…”
Section: Introductionmentioning
confidence: 99%
“…Though this method facilitates handling of the thinned epi-wafer there are some problems such as formation of cracks in epi-layer during anode ohmic alloy process. To avoid the formation of cracks which are caused by the difference in the thermal expansion coefficients between the InP epi-layer and the Au-plated integral heat sink [10][11] the diamond heat sink can be used [12]. In thinning the wafer first, it is thinned prior to the front-side process.…”
Section: Introductionmentioning
confidence: 99%