2008
DOI: 10.1016/j.tsf.2007.08.007
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Adherent amorphous hydrogenated carbon films on metals deposited by plasma enhanced chemical vapor deposition

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Cited by 69 publications
(39 citation statements)
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“…The deposition rate of DLC films on glass substrates was approximately 5 nm/min (almost a third part of DLC deposition rate on metallic surfaces (BONETTI et al, 2006;CAPOTE et al, 2008)). This behavior was expected since metals are generally very good electrical conductors, better than glass.…”
Section: Resultsmentioning
confidence: 99%
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“…The deposition rate of DLC films on glass substrates was approximately 5 nm/min (almost a third part of DLC deposition rate on metallic surfaces (BONETTI et al, 2006;CAPOTE et al, 2008)). This behavior was expected since metals are generally very good electrical conductors, better than glass.…”
Section: Resultsmentioning
confidence: 99%
“…In order to enhance the DLC film adhesion to the substrates (BONETTI et al, 2006;CAPOTE et al, 2008), a thin amorphous silicon interlayer was deposited using silane as the precursor gas (1 sccm gas flow at 11.3 Pa and a discharge voltage of -700 V). The silicon interlayer thickness was varied according to the deposition time.…”
Section: Methodsmentioning
confidence: 99%
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“…La relación de I D /I G fue de 0,8. Teniendo en cuenta este valor y la posición de la banda G podría indicarse que el porcentaje de uniones sp 3 C-C alcanzó aproximadamente el 10% según el modelo de tres etapas propuesto por Ferrari et al [15]. A partir de la pendiente de la línea de ajuste a la base del espectro original, se pudo determinar que el porcentaje de hidrógeno es del 12 ± 2 % aproximadamente [16].…”
Section: Caracterización Del Recubrimiento Y De La Capa Ntiruradaunclassified
“…The DLC films with 20% hydrogen concentration were deposited by using pulsed-DC discharge under controlled conditions on 316L stainless steel substrates using carbonitride diffusion process as interlayer 19,25,26 . The 316L stainless steel surface was modified by single diffusion process during one hour at 430 °C using a mixture of N 2 , H 2 e CH 4 gases.…”
Section: Dlc Coating Preparationmentioning
confidence: 99%