2012
DOI: 10.1021/la3029726
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Adhesion of Colloidal Particles on Modified Electrodes

Abstract: The adhesion between colloidal silica particles and modified electrodes has been studied by direct force measurements with the colloidal probe technique based on the atomic force microscope (AFM). The combination of potentiostatic control of gold electrodes and chemical modification of their surface with self-assembled monolayers (SAMs) allows for the decoupling of forces due to the electrical double layers and functional groups at the solid/liquid interface. Adhesion on such electrodes can be tuned over a lar… Show more

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Cited by 23 publications
(81 citation statements)
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“…The resulting normalization of the experimental adhesion forces F exp by the average radius of the colloidal particles R (see inset in Figure b) is shown in the first column of Table 1 . These values are in good quantitative agreement with estimations based on literature values for the interfacial energies γ within the framework of the JKR‐theory . With the values for the interfacial energies reported by Sinniah et al and Warszyński et al (see compilation in the Supporting Information), one obtains F JKR / R .…”
Section: Resultssupporting
confidence: 89%
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“…The resulting normalization of the experimental adhesion forces F exp by the average radius of the colloidal particles R (see inset in Figure b) is shown in the first column of Table 1 . These values are in good quantitative agreement with estimations based on literature values for the interfacial energies γ within the framework of the JKR‐theory . With the values for the interfacial energies reported by Sinniah et al and Warszyński et al (see compilation in the Supporting Information), one obtains F JKR / R .…”
Section: Resultssupporting
confidence: 89%
“…With the values for the interfacial energies reported by Sinniah et al and Warszyński et al (see compilation in the Supporting Information), one obtains F JKR / R . At pH 4, the electrostatic interactions are largely suppressed and adhesion is dominated by solvent exclusion . We assume in the following that γ CML/COOH = 0 mN m −1 , as no hydrogen bonding or other chemical bonds should be formed.…”
Section: Resultsmentioning
confidence: 99%
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