Adjustable metal particle grid formed through upward directed solid-state dewetting using silicon nanowires

Abstract

Sub-micron sized metal particles were formed through the annealing of sputtered metal thin films on silicon nanowires (SiNWs). During high-temperature annealing, the cylindrical SiNW structures induce the solid-state dewetting behavior...

Protocol for scalable top-down fabrication of InP nanopillars using a self-assembled random mask technique

“…The Au layer thickness can be reduced during e-beam evaporation to ensure adequate thermal permeation across the film to induce complete de-wetting. 4 Alternatively, the deposition rate of SiO x can be lowered during PECVD by tuning down the precursor gas flows (N 2 , N 2 O, SiH 4 ), to allow for a smoother SiO x film. It is also recommended to carry out periodic cleaning of the PECVD chamber to avoid unwanted contamination of the SiO x film.…”