2017
DOI: 10.1016/j.corsci.2017.06.015
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Adjustment of temperature coefficient of electrical resistivity in Cu66Zr34 metallic glass through surface oxidation induced phase decomposition

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Cited by 11 publications
(2 citation statements)
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“…The increase of resistance may be caused by the faster aging of the amorphous film deposited at 393 K compared with that at 308 K, which leads to increased electron scattering. [41][42][43][44] For the films deposited at 308 and 393 K, the electrochemical double layer capacitance (C dl ) of the film deposited at 393 K (26.53 mF cm −2 ) is larger than that of the film deposited at 308 K (17.50 mF cm −2 ), indicating that the former has a larger electrochemically active surface area (ECSA) than the latter, 45 which is probably because the film deposited at 393 K has a more uniform structure than that of the film deposited at 308 K. 46,47 Overall, both charge resistance and ECSA contribute to the higher electrocatalytic performance of the thin film deposited at 393 K (307 mV at 10 mV cm −2 ) than that of the films deposited at the other two substrate temperatures (330 and 333 mV at 10 mA cm −2 for the films deposited at 308 and 573 K, respectively). In addition, the Fe 40 Co 40 Se 20 thin film deposited on carbon fiber paper at 393 K exhibits relatively high electrocatalytic activity toward the OER, compared with other electrocatalysts in Table I.…”
Section: Resultsmentioning
confidence: 99%
“…The increase of resistance may be caused by the faster aging of the amorphous film deposited at 393 K compared with that at 308 K, which leads to increased electron scattering. [41][42][43][44] For the films deposited at 308 and 393 K, the electrochemical double layer capacitance (C dl ) of the film deposited at 393 K (26.53 mF cm −2 ) is larger than that of the film deposited at 308 K (17.50 mF cm −2 ), indicating that the former has a larger electrochemically active surface area (ECSA) than the latter, 45 which is probably because the film deposited at 393 K has a more uniform structure than that of the film deposited at 308 K. 46,47 Overall, both charge resistance and ECSA contribute to the higher electrocatalytic performance of the thin film deposited at 393 K (307 mV at 10 mV cm −2 ) than that of the films deposited at the other two substrate temperatures (330 and 333 mV at 10 mA cm −2 for the films deposited at 308 and 573 K, respectively). In addition, the Fe 40 Co 40 Se 20 thin film deposited on carbon fiber paper at 393 K exhibits relatively high electrocatalytic activity toward the OER, compared with other electrocatalysts in Table I.…”
Section: Resultsmentioning
confidence: 99%
“…Several studies on the oxidation of amorphous Zr-Al [22][23][24][25][26][27], Cu-Zr [28][29][30][31][32][33] and even Cu-Al [34][35][36] binary alloys have been reported in the literature. Cu-Zr binary alloys have the greatest glass-forming ability [37] among these three alloy systems.…”
Section: Introductionmentioning
confidence: 99%