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Butera, R. E.; Suwa, Yuji; Hashizume, Tomihiro; Weaver, J. H.

doi:10.1103/physrevb.80.193307

Cited by 5 publications

(8 citation statements)

References 26 publications

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“…The absence of these bright features in our data suggests that the creation of dangling bonds is due to Cl desorption and not conversion to Cl(i). However, we cannot completely rule out the latter since the low diffusion barrier (0.3 eV to 0.4 eV) from one inserted site to another 41 is more easily overcome at these elevated temperatures, enabling Cl(i) to reach a more stable adsorption site at a step 45 .…”

Section: Resultsmentioning

confidence: 95%

“…Cl 2 was generated from a solid-state, electrochemical cell consisting of AgCl doped with 5 wt % CdCl 2 59 . Cl exposures were done with the sample at roughly 600 K to minimize water contamination and limit Cl atom insertion into the surface 44,45,58,60 . This temperature was sufficient to ensure that any Cl(i) generated as a result of the chemisorption process can diffuse and attach at a dangling bond [43][44][45] , but low enough to prevent activation of etching and roughening processes 30,61 .…”

Section: Experimental Methodsmentioning

confidence: 99%

“…Cl exposures were done with the sample at roughly 600 K to minimize water contamination and limit Cl atom insertion into the surface 44,45,58,60 . This temperature was sufficient to ensure that any Cl(i) generated as a result of the chemisorption process can diffuse and attach at a dangling bond [43][44][45] , but low enough to prevent activation of etching and roughening processes 30,61 . During Cl 2 exposure, the pressure in the chamber remained below 9.3 × 10 −9 Pa (7 × 10 −11 Torr).…”

Section: Experimental Methodsmentioning

confidence: 99%

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STM-Induced Desorption and Lithographic Patterning of Cl–Si(100)-(2 × 1)

2019

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We investigated STM-induced chlorine desorption and lithographic patterning of Cl-terminated Si(100)-(2×1) surfaces at sample temperatures from 4 K to 600 K. STM lithography has previously focused on hydrogen-based chemistry for donor device fabrication. Here, to develop halogen-based chemistries for fabricating acceptor-based devices, we substituted the hydrogen resist with chlorine. Lithographic patterning was explored using both field emission patterning to desorb chlorine from large areas as well as atomic precision patterning to desorb chlorine along one to two dimer rows at a time. We varied the experimental parameters for lithographic patterning and found a positive correlation between pattern line widths and both sample bias voltage and total electron dose. Finally, the use of chlorine, bromine, and iodine as lithographic resists to broaden the range of available chemistries for future device fabrication utilizing halogen-based dopant precursors is discussed. arXiv:1808.05690v2 [cond-mat.mes-hall]

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Section: Resultsmentioning

confidence: 95%

Section: Experimental Methodsmentioning

confidence: 99%

Section: Experimental Methodsmentioning

confidence: 99%

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STM-Induced Desorption and Lithographic Patterning of Cl–Si(100)-(2 × 1)

2019

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“…For some systems or for some particular value of a tuning parameter, it may happen that the first correction-to-scaling term is close to zero, so that in some wide temperature region the system would behave as an infinite one, i.e., the correctionto-scaling terms are not important (see the discussion of such an extended scaling in Ref. [49]).…”

Section: A Temperature Region Windowmentioning

confidence: 99%

Critical amplitude ratios of the Baxter–Wu model

Shchur

Janke

2010

Nuclear Physics B

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A Monte Carlo simulation study of the critical and off-critical behavior of the Baxter-Wu model, which belongs to the universality class of the 4-state Potts model, was performed. We estimate the critical temperature window using known analytical results for the specific heat and magnetization. This helps us to extract reliable values of universal combinations of critical amplitudes with reasonable accuracy. Comparisons with approximate analytical predictions and other numerical results are discussed.

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“…The generalized crossover-scaling forms eqs. (31) and (32) are immediately shown to reduce to eqs. (7) and (8) in the N = 1 case, by using eqs.…”

Section: B the N ≥ 2 Modelsmentioning

confidence: 99%

Extended scaling behavior of the spatially anisotropic classicalXYmodel in the crossover from three to two dimensions

Butera

Pernici

2009

Phys. Rev. B

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The bivariate high-temperature expansion of the spin-spin correlation function of the three-dimensional classical XY ͑planar rotator͒ model, with spatially anisotropic nearest-neighbor couplings, is extended from the tenth through the 21st order. The computation is carried out for the simple cubic lattice, in the absence of magnetic field, in the case in which the coupling strength along the z axis of the lattice is different from those along the x and the y axes. It is then possible to determine accurately the critical temperature as function of the parameter R which characterizes the coupling anisotropy and to check numerically the universality, with respect to R, of the critical exponents of the three-dimensional anisotropic system. The analysis of our data also shows that the main predictions of the generalized scaling theory for the crossover from the three-dimensional to the two-dimensional critical behavior are compatible with the series extrapolations.

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Adsorbate-mediated step transformations and terrace rearrangement ofSi(100)−(2×1)

Cited by 5 publications

References 26 publications

STM-Induced Desorption and Lithographic Patterning of Cl–Si(100)-(2 × 1)

STM-Induced Desorption and Lithographic Patterning of Cl–Si(100)-(2 × 1)

Critical amplitude ratios of the Baxter–Wu model

Extended scaling behavior of the spatially anisotropic classicalXYmodel in the crossover from three to two dimensions

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