2011
DOI: 10.1016/j.molcata.2011.01.010
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Adsorption and photocatalytic degradation of methylene blue over TiO2 films on carbon fiber prepared by atomic layer deposition

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Cited by 68 publications
(17 citation statements)
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“…For all adsorbents, over 80% of the adsorption capacity was reached within the first 20 min of adsorption. Similar quick initial uptake of MB on other adsorbents has been reported in the literature [41,45]. At equilibrium, more MB is adsorbed by titania than by any of the synthesized nanocomposites as shown in Figures 8(b) and 8(c) and listed in Table 4.…”
Section: International Journal Of Photoenergysupporting
confidence: 86%
“…For all adsorbents, over 80% of the adsorption capacity was reached within the first 20 min of adsorption. Similar quick initial uptake of MB on other adsorbents has been reported in the literature [41,45]. At equilibrium, more MB is adsorbed by titania than by any of the synthesized nanocomposites as shown in Figures 8(b) and 8(c) and listed in Table 4.…”
Section: International Journal Of Photoenergysupporting
confidence: 86%
“…The main contribution is attributed to Ti-O (531.0 eV) in TiO 2 [38]. The other two kinds of oxygen contributions can be counted by the hydroxyl groups (532.6 eV) and the C-O bonds (533.5 eV), respectively.…”
Section: Ft-ir and Xps Investigationmentioning
confidence: 99%
“…It is often assumed that the ALD process results in layer-by-layer growth of thin films. However, detailed studies of thin film growth on the nanometer scale show diverse growth modes of thin films by employing ALD [88,104]. NiO nanoparticles were prepared inside commercially available mesoporous silica using 50 ALD cycles and the resulting structure was used as a catalyst for DRM [57,58].…”
Section: Drm Catalysts Consisting Of Nanoparticles Implemented In a Mmentioning
confidence: 99%
“…For both cases (TiO 2 and MgO deposition), H 2 O vapor was used as the oxidizing agent. By altering the number of ALD cycles, the thickness of the metal oxide thin layers could be finely altered [88]. The ALD process generally operates below 300 • C, where metal oxide layers tend to show amorphous structures with rather ill-defined oxidation numbers of metal atoms as opposed to highly crystalline structures [69].…”
Section: Introductionmentioning
confidence: 99%