The atomic layer deposition (ALD) of TiO 2 on a RuO 2 (110) surface from tetrakis(dimethylamido) titanium and water at 110°C was investigated using near ambient pressure Xray photoelectron spectroscopy (NAP-XPS) at precursor pressures up to 0.1 mbar. In addition to the expected cyclic surface species, evidence for side reactions was found. Dimethylamine adsorbs on the surface during the TDMAT half-cycle, and a second species, likely methyl methylenimine, also forms. The removal of the amide ligand and the formation of an alkyammonium species during the water half-cycle were found to be pressure dependent. The O 1s, Ru 3d, and Ti 2p spectra show the formation of the Ru−O−Ti interface, and the binding energies are consistent with formation of TiO 2 after one full ALD cycle. Dosing TDMAT on the RuO 2 (110) surface at room temperature promotes a multilayer formation that begins to desorb at 40°C. The imine species is not seen until 60°C. These insights into the ALD mechanism and precursor pressure dependence on reactivity highlight the utility of NAP-XPS in studying ALD processes and interface formation.