1992
DOI: 10.1016/0039-6028(92)90963-7
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Adsorption and thermal behavior of ethylene on Si(100)-(2 × 1)

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Cited by 204 publications
(139 citation statements)
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References 39 publications
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“…This saturation coverage of 1 ML is consistent with the kinetic uptake measurements of Cheng et al 14 and Clemen et al 15 At low coverage the STM measurement of Mayne et al 8 found that the C 2 H 4 molecules ''prefer'' to adsorb on alternate dimer sites, creating either a local p(2ϫ2) structure or a c(4ϫ2) structure. Based on the above experimental observations, it is expected that for Ͻ c the adsorption of C 2 H 4 on neighboring Si dimers is avoided by some repulsive interaction between adsorbed molecules.…”
supporting
confidence: 84%
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“…This saturation coverage of 1 ML is consistent with the kinetic uptake measurements of Cheng et al 14 and Clemen et al 15 At low coverage the STM measurement of Mayne et al 8 found that the C 2 H 4 molecules ''prefer'' to adsorb on alternate dimer sites, creating either a local p(2ϫ2) structure or a c(4ϫ2) structure. Based on the above experimental observations, it is expected that for Ͻ c the adsorption of C 2 H 4 on neighboring Si dimers is avoided by some repulsive interaction between adsorbed molecules.…”
supporting
confidence: 84%
“…However, an ultraviolet photoemission spectroscopy study with the kinetic uptake method determined the saturation coverage to be ϭ1 ML. [14][15][16] In this work we study the adsorption of both C 2 H 2 and C 2 H 4 molecules on Si͑100͒ for coverages of ϭ0.5 and 1 ML, using the same first-principles calculation scheme. 17,18 Here the equilibrium geometries and energetics of the three existing models, i.e., dimerized, dimer-cleaved, and tetramodels, are considered.…”
mentioning
confidence: 99%
“…Assuming a 10 % defect density, the saturation coverage on non-defective Si(100) sites is near unity (0.8 ± 0.07), i.e., our measurements suggest that each Si 2 dimer site adsorbs a single HREELS measurements [28,29], and by thermodynamic arguments [14,15]. The conversion of chemisorbed hydrocarbon to surface carbon was also investigated using AES.…”
Section: Absolute Coverage Measurements Formentioning
confidence: 70%
“…The ultrahigh vacuum (UHV) system (with a base pressure of 1 x 10-10 Torr) and the Si(100) crystal preparation have been described previously [12][13][14][15][16]; selected aspects will be summarized here. The system is equipped with an Auger electron spectrometer, an argon ion sputtering gun, a collimated and calibrated microcapillary array doser [21], and a multiplexed quadrupole mass spectrometer (QMS) with capabilities for both random flux and line-of-sight detection (22].…”
Section: Methodsmentioning
confidence: 99%
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