Adsorption structure and properties of Ni/Fe electrodeposition interface: a DFT study

Abstract

The density functional theory calculations of the adsorption model of NiCl2, Ni, and Cl on the Fe surface, as well as interface electronic properties, provide theoretical guidance for improving the Ni electrodeposition process. The adsorption properties of these three species on the Fe (100) crystal surface at different coverages, and the adsorption properties of the single Ni on three different crystal surfaces of Fe (100), Fe (110), and Fe (111), were studied through calculations of adsorption energy, charge density, charge occupancy, and DOS. The results indicate that the H sites are the most favorable for the adsorption of Ni and Cl on the Fe (100) surface. T sites, B sites, and H sites are all potential adsorption sites for NiCl2. The order of adsorption strength is Ni > Cl > NiCl2. In response to changes in charge, the adsorption effect exhibits a negative correlation with surface coverage. In addition, the hybridization of Ni’s 3d orbitals, Cl’s 3p orbitals, and Fe’s 3d orbitals changes the distribution of the interface charge, resulting in an increase of the charge in the Fe surface. Ni exhibits better adsorption performance on Fe (100) surface, driven by the lattice structure, surface electron configuration, and Ni–Fe atomic interactions.