Advanced applications in microphotonics using proton beam writing

Bettiol, Andrew A.; Chiam, Sher-Yi; Teo, Ee Jin; Udalagama, C.N.B.; Chan, S.F.; Hoi, Siew-Kit; Kan, J.A. van; Breese, M.B.H.; Watt, F.

doi:10.1016/j.nimb.2009.03.035

Cited by 20 publications

(5 citation statements)

References 29 publications

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“…It involves scanning of a focused proton beam typically with MeV energy, and micron or even sub-micron size within the target material [Fig 31(a)] to induce local structural modifications at micron/submicron scales at the end of range of the penetrating protons. This leads to localized alteration of bond polarizability or material density at the nuclear collision volume, and in turn to a refractive index change [338]. An advantageous feature that differentiates this method from conventional ion/proton implantation is that waveguide formation can be accomplished in a single step without masking the substrate.…”

Section: Proton Beam Writingmentioning

confidence: 99%

Optically pumped planar waveguide lasers, Part I: Fundamentals and fabrication techniques

Grivas

2011

Progress in Quantum Electronics

194

102

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Abstract:The tremendous interest in the field of waveguide lasers in the past two decades is largely attributed to the geometry of the gain medium, which provides the possibility to store optical energy on a very small dimension in the form of an optical mode. This allows for realization of sources with enhanced optical gain, low lasing threshold, and small footprint and opens up exciting possibilities in the area of integrated optics by facilitating their on-chip integration with different functionalities and highly compact photonic circuits. Moreover, this geometrical concept is compatible with high power diode pumping schemes as it provides exceptional thermal management, minimizing the impact of thermal loading on laser performance. The proliferation of techniques for fabrication and processing capable of producing high optical quality waveguides has greatly contributed to the growth of waveguide lasers from a topic of fundamental research to an area that encompasses a variety of practical applications. In this first part of the review on optically pumped waveguide lasers the properties that distinguish these sources from other classes of lasers will be discussed. Furthermore, the current state-of-the art in terms of fabrication tools used for producing waveguide lasers is reviewed from the aspects of the processes and the materials involved. 2 1.IntroductionOver the last two decades the field of solid-state planar waveguide lasers has experienced a steady growth, progressing from a laboratory curiosity to an area that demonstrates a broad spectrum of applications, from multiwavelength laser channel arrays for telecommunications to diode-pumped planar structures with multiwatt output powers for sensing and ranging applications. Waveguide lasers are by no means a new field and the first report on such a source dates back in 1961, when laser operation of a waveguide based on an active glass core rod embedded in a low refractive index cladding was demonstrated [1]. However research efforts in the years that followed this report focused primarily on the development of optically pumped laser sources based on high optical quality bulk dielectric laser media in the form of rods and slabs. The merits of the waveguide geometry and the associated optical confinement have been first highlighted in single mode glass optical fibers. Fibers have proven an enabling technology for realization of highly efficient amplifier and laser sources owing to their unrivalled low loss performance and ability to maintain a small spot size and hence high intensities over lengths that are orders of magnitude longer than would normally be allowed by diffraction, [2,3]. Er-doped fiber amplifiers (EDFAs) in particular have directly contributed to the enormous expansion of the optical communications networks that underpin today's internet infrastructure by allowing for signal regeneration and optical data transmission over long distances. The excellent performance of fiber lasers and amplifiers provided motivation and triggered a major techn...

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Section: Proton Beam Writingmentioning

confidence: 99%

Optically pumped planar waveguide lasers, Part I: Fundamentals and fabrication techniques

Grivas

2011

Progress in Quantum Electronics

194

102

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“…Second, the temperature of the target can be controlled at low, room, or high temperatures, thus the diffusion of implanted ions and the radiation damage can be tailored. Lastly, the interaction region can be well-defined by combining lithography (the technique of ion beam lithography by means of particle beam writing has been developed using the light ion microbeam system; ion beam lithography has been a major application for MeV energy ion microbeams to fabricate micro-/nanostructures with a high aspect ratio) and mask technology.…”

Section: Ion Beam Technologymentioning

confidence: 99%

Recent Progress in the Application of Ion Beam Technology in the Modification and Fabrication of Nanostructured Energy Materials

Huang,

Wu,

Cai

et al. 2024

ACS Nano

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The development of green, renewable energy conversion and storage systems is an urgent task to address the energy crisis and environmental issues in the future. To achieve high performance, stable, and safe operation of energy conversion and storage systems, energy materials need to be modified and fabricated through rationalization. Among various modification and fabrication strategies, ion beam technology has been widely used to introduce various defects/ dopants into energy materials and fabricate various nanostructures, where the structure, composition, and property of prefabricated materials can be further accurately tailored to achieve better performance. In this paper, we review the recent progress in the application of ion beam technology in material modification and fabrication, focusing on nanostructured energy materials for energy conversion and storage including photo-(electro-) water splitting, batteries (solar cells, fuel cells, and metal-ion batteries), supercapacitors, thermoelectrics, and hydrogen storage. This review first provides a brief basic overview of ion beam technology and describes the classification and technological advantages of ion beam technology in the modification and fabrication of materials. Then, modification of energy materials by ion beams is reviewed mainly concerning doping and defect introduction. Fabrication of energy materials is also discussed mainly in terms of heterojunctions, nanoparticles, nanocavities, and other nanostructures. In particular, we emphasize the advantages of ion beam technology in improving the performance of energy materials. Finally, we point out our understanding of challenges and future perspectives in applying ion beam technology for the modification and fabrication of energy materials.

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“…Ion implanters operate in the energy range from tens of eV to several MeV according to their applications. Usually, ion implanters having low energy in 1 to 200 keV ranges are utilized for treating the surface of solids or doping in semiconductors. − Also, a low-energy ion implanter can be used for welding nanostructures like nanowires (NWs), nanotubes, or integrating NWs in nanodevices, which are now special applications of an ion implanter in the area of nanotechnology. − However, medium-energy ions in the range of ∼300 keV to 50 MeV are used for producing a proton beam apart from the synthesis and modification of thin films. − High-energy protons and rapid heavy ions with energies of ∼50 MeV to hundreds of MeV are utilized for surface modification and physical properties of thin films. − In addition to incorporation of impurities, the foremost feature of ion implantation is the creation of point defects due to collisions by the energetic ion. Minute concentrations of defects and impurities in semiconductors can hugely alter the mechanical, electrical, optical, and magnetic properties of the materials. − Therefore, for an application of ion implantation, a knowledge of the fundamental physics and chemistry behind the interaction of the ion beam and the target is required.…”

Section: Introductionmentioning

confidence: 99%

Efficacy of Ion Implantation in Zinc Oxide for Optoelectronic Applications: A Review

Das

Basak

2021

ACS Appl. Electron. Mater.

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Unlike the majority of the silicon-based electronic devices, optoelectronic devices are predominantly made using III–V and II–VI semiconductor compounds and their alloys because of their direct bandgap. Among these, zinc oxide (ZnO) is a multifunctional wide bandgap II–VI semiconductor material that has distinctive properties, such as large excitonic binding energy, high-sensitivity, nontoxicity, and good compatibility, which favors it to be considered for various optoelectronic applications including photoelectrochemical (PEC) water splitting, light-emitting diodes (LEDs), photovoltaics, and photodetectors. Though the research concentrated on ZnO started many decades ago, the renewed interest is rekindled only with the availability of high-quality single-crystal substrates, easy growth techniques of various nanostructures, and reports on p-type ZnO. Therefore, ZnO is being treated as a concentrated research focus during the last two decades by researchers encompassing a vast field starting from luminescent materials, energy storage and conversion, to biomedical sensors, and so on. Ion beam irradiation is a fruitful approach to modify the properties of semiconducting oxides by introducing not only impurities but also defects, strains, structural transitions, and others. The necessity of a timely in-depth and critical review of the progress on ion implantation in ZnO is the origin of this Review, which focuses on the recent implantation efforts in nanostructured ZnO thin films as well as single crystals. In the beginning, with an introduction to the general principles of ion implantation, this Review presents interactions and distribution of implantation-induced defects in ZnO. Next, comprehensive analyses on the influence of ion implantation on the optical, electrical properties, and optoelectronic applications including PEC water splitting and LEDs have been revealed. Most importantly, in each section from a “state-of-the-art” of the domain, some critical connections have been provided between the results of the theoretical simulations of the implanted ion-induced defects and the reported data, which in particular would be able to offer significant insights for both theoretical and experimental research community working with the oxide semiconductors. At the end, a summary with future directions for utilizing ion implantation for achieving ZnO thin-film-based high-performance devices has been presented. By including a sufficient breadth and depth of literature coverage in this Review, we believe that it would also tend to reveal the inconsistencies in the extant body of research.

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Advanced applications in microphotonics using proton beam writing

Cited by 20 publications

References 29 publications

Optically pumped planar waveguide lasers, Part I: Fundamentals and fabrication techniques

Optically pumped planar waveguide lasers, Part I: Fundamentals and fabrication techniques

Recent Progress in the Application of Ion Beam Technology in the Modification and Fabrication of Nanostructured Energy Materials

Efficacy of Ion Implantation in Zinc Oxide for Optoelectronic Applications: A Review

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