2017
DOI: 10.1016/j.surfcoat.2017.07.089
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Advanced deposition of hard a-C:Me coatings by HPPMS using Ne as process gas

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Cited by 7 publications
(1 citation statement)
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“…This leads to an increase of the electron impact ionization rate coefficient and thus to an increase of the ionization probability of the sputtered carbon species. Several authors have reported that partially or even totally replacing the conventional Ar sputtering gas with Ne [21][22][23] results in a significant improvement of the DLC coating's mechanical and tribological properties. Besides producing an increased ionization degree of the film forming species, HiPIMS also has the potential to provide the possibility for selecting bombarding ions by suitably synchronizing the substrate bias with HiPIMS pulses.…”
Section: Introductionmentioning
confidence: 99%
“…This leads to an increase of the electron impact ionization rate coefficient and thus to an increase of the ionization probability of the sputtered carbon species. Several authors have reported that partially or even totally replacing the conventional Ar sputtering gas with Ne [21][22][23] results in a significant improvement of the DLC coating's mechanical and tribological properties. Besides producing an increased ionization degree of the film forming species, HiPIMS also has the potential to provide the possibility for selecting bombarding ions by suitably synchronizing the substrate bias with HiPIMS pulses.…”
Section: Introductionmentioning
confidence: 99%