Advanced Electron Microscopy for Materials Science

Akase, Zentaro; Higo, Mitsuaki; Shimada, Keiko; Sato, Takafumi; Magara, Hideyuki; Shindo, Daisuke; Ohno, Nobuhiko

doi:10.2320/matertrans.mt-m2021086

Cited by 7 publications

(2 citation statements)

References 64 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Readers can find that two special issues related to SEM and TEM analyses were published from Materials Transactions, of which studies were introduced in the CTR. 110,111) For an additional comment, one of the awarded papers dealt with direct reduction of TiO 2 3) and interested readers can find the related topic reviewed extensively in a latest CTR paper by Suzuki et al 112)…”

Section: Editor's Remarksmentioning

confidence: 99%

Best Papers Awarded in 2021 by <i>Materials Transactions</i>

Horita¹

2022

Mater. Trans.

View full text Add to dashboard Cite

This paper introduces the 11 best papers awarded in 2021 by Materials Transactions. Their brief summaries are given to overview current research areas. The best papers were carefully selected from the 6 different research areas such as (1) materials physics, (2) microstructures of materials, (3) mechanics of materials, (4) materials chemistry, (5) materials processing, and (6) engineering materials and their applications. Six out of the 11 best papers are those specially selected for young scientists whose ages are 35 or below. An important trend in the year of 2020 is that four out of the 11 best papers are concerned with high-entropy alloys, reflecting current research based on a national project.

show abstract

Section: Editor's Remarksmentioning

confidence: 99%

Best Papers Awarded in 2021 by <i>Materials Transactions</i>

Horita¹

2022

Mater. Trans.

View full text Add to dashboard Cite

show abstract

“…This ELF keeps the production capacity away from its original designed pattern or layouts. Especially, electronic fine tools including scanning electron microscopy (SEM) systems, transmission electron microscopy (TEM) systems, focused ion beam (FIB) systems, and electron beam lithography (E-Beam) systems are very susceptible to ELF magnetic fields [3][4][5]. This misoperation happens because of ELF magnetic fields inducing the beam shift during the measurement or process for cutting-edge chips below the 40-nanometer process.…”

Section: Introductionmentioning

confidence: 99%

Mitigation of Electro Magnetic Interference by Using C-Shaped Composite Cylindrical Device

et al. 2022

View full text Add to dashboard Cite

The extremely low-frequency (ELF) and its corresponding electromagnetic field influences the yield of CMOS processes in the foundry, especially for high-end equipment such as scanning electron microscopy (SEM) systems, transmission electron microscopy (TEM) systems, focused ion beam (FIB) systems, and electron beam lithography (E-Beam) systems. There are several techniques to mitigate electromagnetic interference (EMI), among which active shielding systems and passive shielding methods are widely used. An active shielding system is used to generate an internal electromagnetic field to reduce the detected external electromagnetic field in electric coils with the help of the current. Although the active shielding system reduces the EMI impact, it induces an internal electromagnetic field that could affect the function of nearby tools and/or high-performance probes. Therefore, in this study, we have used a C-shaped cylindrical device combined with an active shielding system and passive shielding techniques to reduce EMI for online monitoring and to overcome the aforementioned issues. In this study, the active shielding system was wrapped with a permalloy composite material (i.e., a composite of nickel and iron alloy) as a tubular device. A C-shaped opening was made on the tubular structure vertically or horizontally to guide the propagation of the electromagnetic field. This C-shaped cylindrical device further reduced electromagnetic noise up to −5.06 dB and redirected the electromagnetic field toward the opening direction on the cylindrical device. The results demonstrated a practical reduction of the electromagnetic field.

show abstract

Collective Motions of Electrons Around Various Charged Insulators

2022

Material Characterization Using Electron Holography

View full text Add to dashboard Cite

Advanced Electron Microscopy for Materials Science

Cited by 7 publications

References 64 publications

Best Papers Awarded in 2021 by <i>Materials Transactions</i>

Best Papers Awarded in 2021 by <i>Materials Transactions</i>

Mitigation of Electro Magnetic Interference by Using C-Shaped Composite Cylindrical Device

Collective Motions of Electrons Around Various Charged Insulators

Contact Info

Product

Resources

About