2018
DOI: 10.1016/j.ultramic.2018.05.005
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Advanced microheater for in situ transmission electron microscopy; enabling unexplored analytical studies and extreme spatial stability

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Cited by 59 publications
(53 citation statements)
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“…2b). We observed no change in performance with activation of the MEMS heater during experiments up to temperatures of 823 K. In line with our measurements, the temperature stability, precision, control, and uniformity in similar MEMS chips are well documented up to the maximum temperatures, usually ~1073 K (800°C) (Allard et al, 2009; Mele et al, 2016; Perez-Garza et al, 2016; van Omme et al, 2018; Gaulandris et al, 2020). Cooled to the cryogenic baseline of ~100 K without MEMS heating (Fig.…”
Section: Resultssupporting
confidence: 88%
“…2b). We observed no change in performance with activation of the MEMS heater during experiments up to temperatures of 823 K. In line with our measurements, the temperature stability, precision, control, and uniformity in similar MEMS chips are well documented up to the maximum temperatures, usually ~1073 K (800°C) (Allard et al, 2009; Mele et al, 2016; Perez-Garza et al, 2016; van Omme et al, 2018; Gaulandris et al, 2020). Cooled to the cryogenic baseline of ~100 K without MEMS heating (Fig.…”
Section: Resultssupporting
confidence: 88%
“…The microheater consists of a spiral-shaped metal that is embedded between two layers of silicon nitride that form a membrane ( Figure 1 a,b). 24 A silicon substrate supports the membrane with the microheater and enables loading into a dedicated TEM holder. Four metal needles connect the holder with the metal contacts of the microheater.…”
Section: Resultsmentioning
confidence: 99%
“…The metal heating coil resistance is linearly dependent on the temperature, which allows for simultaneous heating and accurate temperature measurement 56. In this way the software is able to control the temperature via a closed loop feedback algorithm, similar to our previous efforts for in situ heating in vacuum or gas 48,57. In this case the heater is not located on a membrane close to the imaging area but on the silicon substrate instead(Figure 2).…”
mentioning
confidence: 96%